Studying of kinetic growth of organic thin films

• Autorzy: Weszka J. P. , Jarka P. , Pakuła D. , Dobrzański L. A. , Domański M. , Jurusik J.
• Języki publikacji: EN

Abstrakty

EN

Purpose: of this paper: Studying of growth kinetic of organic thin film prepared by vacuum thermal evaporation technology. Design/methodology/approach: Applying of quartz crystal microbalance to thickness control of organic thin films deposition process. Findings: Results of this issue suggesting that the kinetics of organic thin films is depending of current flowing through the crucible (crucible temperature). Research limitations/implications: Kinetics of vacuum evaporation of thin film is different from that of inorganic thin films during the growth process. Practical implications: The means of connect the quartz crystal microbalance MSV 1843/AB with vacuum chamber, function and means of thickness and deposition rate measuring has been described. This scientific paper include also description of researching results of kinetics of organic and metallic thin film evaporation process by MSV 1843/AB quartz crystal microbalance and verification these results by comparing them with results from other measuring techniques. Originality/value: Controlling thickness of thermally evaporated organic thin film during the film growth process.

Słowa kluczowe

EN

engineering polymer; thin film; deposition rate

PL

polimer inżynierski; cienka warstwa; szybkość osadzania

• Wydawca: International OCSCO World Press
• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2009
• Tom: Vol. 35, nr 1
• Strony: 29--36
• Opis fizyczny: Bibliogr. 15 poz., rys., tabl.

Twórcy

autor

Weszka J. P.

autor

Jarka P.

autor

Pakuła D.

autor

Dobrzański L. A.

autor

Domański M.

autor

Jurusik J.

• Division of Materials Processing Technology, Management and Computer Techniques in Materials Science,Institute of Engineering Materials and Biomaterials, Silesian University of Technology,ul. Konarskiego 18a, 44-100 Gliwice, Poland,

Bibliografia

• [1] L. A. Dobrzański, Elements of materials science, WNT Warsaw, 2002 (in Polish).
• [2] S. Kulaszewicz, Thin transparent electro-conducting layers, Bialystok University of Technology, Białystok ,1994(in Polish).
• [3] S. Ignatowicz, A. Kobendza, Thin layers of semi conducting compounds, PWN, Warsaw 1981(in Polish).
• [4] W. Szlezyngier, Plastic materials, Rzeszow University of Technology, Rzeszów, 1996(in Polish).
• [5] A. Lewińska - Romicka, Methods of thickness measurements, Gamma, Warsaw, 2001 (in Polish).
• [6] B. Osuchowska, Layers techniques in microelectronics, WNT, Warsaw, 1973 (in Polish).
• [7] J. Tyczkowski, Thin film of plasma polymers, WNT, Warsaw, 1990 (in Polish).
• [8] J. Groszkowski, High vacuum technology, WNT, Warsaw, 1978 (in Polish).
• [9] J. Weszka, M. Domanski, B. Jarzabek, J. Jurusik, J. Cisowski, A. Burian, Influence of technological conditions on electronic transitions in chemical vapour deposited poly(azomethine) thin films, Thin Solid Films, In Press, Corrected Proof, 2007.
• [10] Manual of MSV 1843/AB quartz crystal monitor.
• [11] B. Jarzabek J. Weszka. M. Domanski J. Jurusik, J. Cisowski, Optical properties of amorphous polyazomethine thin films, Journal of Non-Crystalline Solids 352/9-20 (2006) 1660-1662.
• [12] L. Cunha, A. C. Fernandes, F. Vaz, N. M. G. Parreira, Ph. Goudeau, E. Le Bourhis, J. P. Riviere, D. Munteanu, F. Borza, Characterisation of TiCxOy thin produced by PVD techniques, Journal of Achievements in Materials and Manufacturing Engineering 21/1 (2007) 35-38.
• [13] L. A. Dobrzański , L. W. Żukowska, J. Kubacki, K. Gołombek, J. Mikuła, XPS and AES analysis of PVD coatings, Journal of Achievements of Materials Science and Engineering 32/2 (2008) 99-102.
• [14] M. Polok-Rubiniec, L. A. Dobrzański, M. Adamiak, The properties and wear resistance of the CrN PVD coatings, Journal of Achievements in Materials Manufacturing Engineering 30/2 (2008) 165-171.
• [15] A. Baron, D. Szewieczek, R. Nowosielski, Selected manufacturing techniques of nanomaterials, Journal of Achievements in Materials Manufacturing Engineering 20 (2008) 83-86.