Microstructure of pulsed laser deposited Ti, TiN and TiO thin layers.

• Autorzy: Major B. , Ebner R. , Kusiński J. , Wołczyński W. , Morgiel J. , Maziarz W.
• Konferencja: AMT'98 XVth Physical Metallurgy and Materials Science Conference 'Advanced materials & technologies' 17-21 May, 1998, Kraków-Krynica, Poland.
• Języki publikacji: EN

Abstrakty

EN

Complex structural examinations were performed on thin layers of Ti, TiN and TiO obtained by means of pulsed laser deposition (PLD). Influence of deposition parameters on the film morphology was under examination. The received films revealed an uniform nanostructure. Appearance of a tetragonal Ti-phase was stated in the deposited Ti layers in argon atmosphere. The TiN-phase was formed independently of the nitrogen flow. By increasing concentration of oxygen in the chamber, transition of oxides from Ti2O via TiO to TiO2 was observed. TEM examination of cross-sections of Ti layers revealed a micro-collumnar structure as well as verified the existence of the tetragonal phase. The deposited TiO layer was characterized by a {001} texture.

Słowa kluczowe

EN

thin layer; deposition; pulsed laser; nanostructure; titanium; titanium nitride; residual stresses; ferritic steel; crystallographic texture

PL

cienka warstwa; osadzanie; laser impulsowy; nanostruktura; tytan; azotek tytanu (TiN); naprężenia szczątkowe; stal ferrytyczna; tekstura krystalograficzna

• Wydawca: Wydawnictwo SIGMA-NOT
• Czasopismo: Inżynieria Materiałowa
• Rocznik: 1998
• Tom: R. XIX, nr 4
• Strony: 1057--1060

Twórcy

autor

Major B.

autor

Ebner R.

autor

Kusiński J.

autor

Wołczyński W.

autor

Morgiel J.

autor

Maziarz W.

• Polish Academy of Sciences, Institute of Metallurgy and Materials Science, Kraków