Rf sputtered TiO2 thin films modified by WO3.

• Autorzy: Sobaś P. , Komornicki S. , Radecka M. , Zakrzewska K.
• Konferencja: XV Physical Metallurgy and Materials Science Conference on Advanced Materials & Technologies AMT'98, Kraków-Krynica, Poland, 17-21 May, 1998
• Języki publikacji: EN

Abstrakty

EN

TiO2 thin films modified by WO3 were deposited by rf sputtering from Ti-W metallic target. Tungsten content, W(Ti+W) in TiO2-WO3 thin films was varied from 0 to 0.5. Anatase polymorphic form was obtained in films with relatively high tungsten atomic ratio. The optical transmission spectra of as-sputtered and annealed samples confirmed the transformation from amorphous to polycrystalline state. High level of diffused transmission (10%) in the vicinity of the fundamental absorption edge was observed for annealed samples.

Słowa kluczowe

EN

thin film; titanium dioxide; tungsten; annealing; crystallization; rf sputtering

PL

cienka warstwa; dwutlenek tytanu; wolfram; wyżarzanie; krystalizacja; rozpylanie jonowe prądami w.cz.

• Wydawca: Wydawnictwo SIGMA-NOT
• Czasopismo: Inżynieria Materiałowa
• Rocznik: 1998
• Tom: R. XIX, nr 4
• Strony: 856--859
• Opis fizyczny: Bibliogr. 7 poz., rys.

Twórcy

autor

Sobaś P.

• Department of Inorganic Chemistry, Institute of Electronics, University of Mining and Metallurgy, Kraków, Poland

autor

Komornicki S.

• Department of Inorganic Chemistry, Institute of Electronics, University of Mining and Metallurgy, Kraków, Poland

autor

Radecka M.

• Department of Inorganic Chemistry, Institute of Electronics, University of Mining and Metallurgy, Kraków, Poland

autor

Zakrzewska K.

• Department of Inorganic Chemistry, Institute of Electronics, University of Mining and Metallurgy, Kraków, Poland

• University of Mining and Metallurgy, Department of Inorganic Chemistry

Bibliografia

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