Correlation between electric parameters of carbon layers and their capacity for field emission

• Autorzy: Gronau R.
• Języki publikacji: EN

Abstrakty

EN

The aim of this work is to study a possibility of field electron emission from carbon layers produced by radio frequency plasma chemical vapor deposition (RF PCVD) method. A correlation between electric parameters of the layers and the ability to produce electron emission is also studied through material (AFM) and electrical (C-V, I-V) characterization of the obtained layers. It is demonstrated that the layers deposited with the highest self-bias exhibit the highest capacity for electron emission.

Słowa kluczowe

EN

carbon layers; diamond-like carbon (DLC); field emission; RF PACVD; AFM; capacitance-voltage (C-V); current-voltage (I-V)

• Wydawca: Instytut Łączności - Państwowy Instytut Badawczy
• Czasopismo: Journal of Telecommunications and Information Technology
• Rocznik: 2007
• Tom: nr 3
• Strony: 37--38
• Opis fizyczny: Bibliogr. 2 poz., rys., tab.

Twórcy

autor

Gronau R.

• Institute of Microelectronics and Optoelectronics, Warsaw University of Technology Koszykowa st 75, 00-662 Warsaw, Poland,

Bibliografia

• [1] F. A. M. Köck, J. M. Garguilo, and R. J. Nemanich, “Direct correlation of surface morphology with electron emission sites forintrinsic nanocrystalline diamond films”, Diam. Rel. Mater., vol. 13, pp. 1022–1025, 2004.
• [2] B. L Druz, V. I. Polyakov, A. V. Karabutov, N. M. Rossukanyi, A. I. Ruskovishnicov, E. Ostan, A. Hayes, V. D. Frolov, and V. I. Konov, “Field electron emission from diamond-like carbon films deposited using RF inductively coupled CH4-plasma source”, Diam. Rel. Mater., vol. 7, pp. 695–698, 1998.