Performance and operation of stressed dual gap RF MEMS varactors

• Autorzy: McFeetors G. , Okoniewski M.
• Języki publikacji: EN

Abstrakty

EN

The design, fabrication and measurement of a con- tinuously tunable RF MEMS capacitor is described. The capacitor's dual gap height architecture allows for electro- static tuning with low resistive loss and a large tuning range. A new dual tuning scheme is introduced for use with two voltage sources. This dual tuning, coupled with a stress-induced bridge, is used to reach further device tuning. Measurements indicate a continuously tunable capacitance range of 6.2:1 with a quality factor over 50 at 30 GHz for 310 fF.

Słowa kluczowe

EN

electromechanical systems (MEMS); varactors; capacitors; Q facto

• Wydawca: Instytut Łączności - Państwowy Instytut Badawczy
• Czasopismo: Journal of Telecommunications and Information Technology
• Rocznik: 2007
• Tom: nr 1
• Strony: 3--7
• Opis fizyczny: Bibliogr. 11 poz., rys., tab.

Twórcy

autor

McFeetors G.

autor

Okoniewski M.

• Department of Electrical and Computer Engineering, University of Calgary, 2500 University Drive N.W., Calgary, Alberta, T2J 1K5, Canada,

Bibliografia

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• [7] G. M. Rebeiz, RF MEMS Theory, Design, and Technology. Hoboken: Wiley, 2003.
• [8] E. K. Chan et al., “Design and fabrication of a novel two-dimension MEMS-based tunable capacitor”, IEEE Int. Conf. Commun., Circ. Syst., Chengdu, China, 2002, vol. 2, pp. 1766–1769.
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• [10] G. McFeetors and M. Okoniewski, “Distributed MEMS analog phase shifter with enhanced tuning”, IEEE Microw. Wirel. Compon. Lett., vol. 16, no. 1, pp. 34–36, 2006.
• [11] S. V. Hum, G. McFeetors, and M. Okoniewski, “Integrated MEMS reflectarray elements”, in 1st Eur. Conf. Anten. Propagat., Nice, France, 2006.