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http://yadda.icm.edu.pl:443/baztech/element/bwmeta1.element.baztech-afa9db23-e6b8-45ab-94f0-13a13da42c57

Czasopismo

Inżynieria Chemiczna i Procesowa

Tytuł artykułu

Zastosowania obliczeniowej mechaniki płynów (CFD) w inżynierii chemicznej i procesowej

Autorzy Bałdyga, J. 
Treść / Zawartość
Warianty tytułu
EN Applicartions of Computational Fluid Mechanics (CFD) in chemical and process engineering
Języki publikacji PL
Abstrakty
PL Przedstawiono możliwości wykorzystania oprogramowania obliczeniowej mechaniki płynów (CFD) do symulacji przebiegu procesów znajdujących się w obszarze zainteresowania inżynierii chemicznej i procesowej. Rozważono układy z przepływem laminarnym i burzliwym, jedno i wielofazowe; przedyskutowano też sposoby opisu przebiegu reakcji chemicznych i precypitacji, oraz możliwości przewidywania jakości produktów symulowanych procesów. Omówiono uproszczenia stosowane w poszczególnych modelach i związane z tym ograniczenia stosowalności i dokładności modeli.
EN The paper summarises the present abilities of the models of Computational Fluid Dynamics (CFD) to simulate the processes from the area of interest of chemical and process engineering. Laminar and turbulent flow processes carried out in the single- and multiphase systems are considered. Methods applied to model the course of chemical reactions and precipitation precresses are presented and discussed as well with particular emphasis on prediction of the product quality. Effects of simplifications applied in the CFD models on their accuracy and limitations in their applications are discussed.
Słowa kluczowe
PL obliczeniowa mechanika płynów   CFD   inżynieria chemiczna   inżynieria procesowa  
EN computational fluid mechanics   CFD   chemical engineering   process engineering  
Wydawca Komitet Inżynierii Chemicznej i Procesowej Polskiej Akademii Nauk
Czasopismo Inżynieria Chemiczna i Procesowa
Rocznik 2001
Tom T. 22, z. 3A
Strony 3--14
Opis fizyczny Bibliogr. 59 poz.
Twórcy
autor Bałdyga, J.
  • Politechnika Warszawska. Wydział Inżynierii Chemicznej i Procesowej, ul. Waryńskiego 1. 00-645 Warszawa
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