Optical properties of the Al2O3/SiO2 and Al2O3/HfO2/SiO2 antireflective coatings

• Autorzy: Marszalek K , Winkowski P , Jaglarz J.

Identyfikatory

DOI

10.2478/s13536-013-0156-y

• Języki publikacji: EN

Abstrakty

EN

Investigations of bilayer and trilayer Al2O3/SiO2 and Al2O3/HfO2/SiO2 antireflective coatings are presented in this paper. The oxide films were deposited on a heated quartz glass by e-gun evaporation in a vacuum of 5 × 10 ^-3 [Pa] in the presence of oxygen. Depositions were performed at three different temperatures of the substrates: 100 °C, 200 °C and 300 °C. The coatings were deposited onto optical quartz glass (Corning HPFS). The thickness and deposition rate were controlled with Inficon XTC/2 thickness measuring system. Deposition rate was equal to 0.6 nm/s for Al2O3, 0.6 nm – 0.8 nm/s for HfO2 and 0.6 nm/s for SiO2. Simulations leading to optimization of the thin film thickness and the experimental results of optical measurements, which were carried out during and after the deposition process, have been presented. The optical thickness values, obtained from the measurements performed during the deposition process were as follows: 78 nm/78 nm for Al2O3/SiO2 and 78 nm/156 nm/78 nm for Al2O3 /HfO2/SiO2. The results were then checked by ellipsometric technique. Reflectance of the films depended on the substrate temperature during the deposition process. Starting from 240 nm to the beginning of visible region, the average reflectance of the trilayer system was below 1 % and for the bilayer, minima of the reflectance were equal to 1.6 %, 1.15 % and 0.8 % for deposition temperatures of 100 °C, 200 °C and 300 °C, respectively.

Słowa kluczowe

EN

antireflective coatings; Al2O3; HfO2; SiO2; optical measurements

• Wydawca: De Gruyter
• Czasopismo: Materials Science Poland
• Rocznik: 2014
• Tom: Vol. 32, No. 1
• Strony: 80--87
• Opis fizyczny: Bibliogr. 23 poz., rys., tab., wykr.

Twórcy

autor

Marszalek K

• AGH University of Science and Technology, Al. Mickiewicza 30, 30-059 Cracow

autor

Winkowski P

• PEVIN, ul. Piaskowa 55, 31-341 Cracow

autor

Jaglarz J.

• Institute of Physics Cracow University of Technology, ul. Podchorazych 1, 30-084 Cracow

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