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Electronic parameters of MIS Schottky diodes with DNA biopolymer interlayer

Autorzy
Identyfikatory
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
In this work, we prepared an ideal Cu/DNA/n-InP biopolymer-inorganic Schottky sandwich device formed by coating a n-InP semiconductor wafer with a biopolymer DNA. The Cu/DNA/n-InP contact showed a good rectifying behavior. The ideality factor value of 1.08 and the barrier height (Φb) value of 0.70 eV for the Cu/DNA/n-InP device were determined from the forward bias I-V characteristics. It was seen that the Φb value of 0.70 eV obtained for the Cu/DNA/n-InP contact was significantly larger than the value of 0.48 eV of conventional Cu/n-InP Schottky diodes. Modification of the interfacial potential barrier of Cu/n-InP diode was achieved using a thin interlayer of DNA biopolymer. This was attributed to the fact that DNA biopolymer interlayer increased the effective barrier height by influencing the space charge region of InP.
Wydawca
Rocznik
Strony
593--600
Opis fizyczny
Bibliogr. 57 poz., rys.
Twórcy
autor
  • Department of Physics, Faculty of Sciences and Arts, Batman University, Batman, Turkey
autor
  • Department of Physics Eng., Faculty of Sciences, Istanbul Medeniyet University, Istanbul, Turkey
Bibliografia
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Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-ab2dc0ba-5d2d-42f5-87bf-54ac743dd961
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