The Morphology and Structure of ZnO Thin Films Deposited by ALD Method

• Autorzy: Boryło P. , Matus K. , Lukaszkowicz K. , Gołombek K.

Identyfikatory

DOI

10.24425/118919

• Języki publikacji: EN

Abstrakty

EN

This paper presents research results of zinc oxide thin films deposited on a glass substrate with use of ALD method. Our researches focused on analyzing of the influence of ALD deposition process temperature on the morphology and transparency of thin layers. The morphology was examined using both scanning and transmission electron microscopes. Transparency study was performed by UV-VIS spectroscopy. For our experiments, two sets of the coating have been prepared, differing in temperature and number of cycle used during the preparation process. The first set was deposited in 100 cycles, second one in 500 cycles. Each set of tested coating contained samples prepared at different temperatures.

Słowa kluczowe

EN

ALD; ZnO; SEM; TEM; UV/VIS

• Wydawca: Institute of Metallurgy and Materials Science of Polish Academy of Sciences ; Committee of Materials Engineering and Metallurgy of Polish Academy of Sciences
• Czasopismo: Archives of Metallurgy and Materials
• Rocznik: 2018
• Tom: Vol. 63, iss. 1
• Strony: 129--133
• Opis fizyczny: Bibliogr. 13 poz., rys., tab.

Twórcy

autor

Boryło P.

• Institute of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Akademicka 2a, 44-100 Gliwice, Poland

autor

Matus K.

• Institute of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Akademicka 2a, 44-100 Gliwice, Poland

autor

Lukaszkowicz K.

• Institute of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Akademicka 2a, 44-100 Gliwice, Poland

autor

Gołombek K.

• Institute of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Akademicka 2a, 44-100 Gliwice, Poland

Bibliografia

• [1] N. Pinna, M. Knez, Atomic Layer Deposition of Nanostructured Materials, Wiley-VCH, Weinheim, 2012.
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• [3] P. M. Martin, Handbook of deposition technologies for films and coatings – science, applications and technology, Elsevier Inc., Burlington, USA, 2010.
• [4] H. S. Nalwa, Handbook of thin film materials Vol. 1, Deposition and processing of thin films, Academic Press, San Diego, USA, 2002.
• [5] L. A. Dobrzański, M. Szindler, Elektronika 8, 125 (2012).
• [6] T. Tynell, M. Karppinen, Atomic layer deposition of ZnO, A review, Semiconductor Science and Technology 29, 043001 (2014).
• [7] H. M. Ali, H. A. Mohamed, S. H. Mohamed, The European Physical Journal Applied Physics 31, 87 (2005).
• [8] L. Wei, C. Shuying, Journal of Semiconductors 32/1, 013002 (2011).
• [9] M. Oshima, K. Yoshino, Japanese Journal of Applied Physics 50/5S2, 05FB15 (2011).
• [10] M. M. Ristova, A. Gligorova, I. Nasov, D. Gracin, M. Milun, H. Kostadinova-Boskova, R. Popeski-Dimovski, Journal of Electronic Materials 41/11, 3087 (2012).
• [11] K. Ellmer, A. Klein, B. Rech, Transparent Conductive Zinc Oxide, Springer, Berlin 2008.
• [12] R. Escudero, R. Escamilla, Solid State Communications 151/2, 97 (2011).
• [13] A. Illiberi, F. Roozeboom, P. Poodt, ACS Appl. Mater. Interfaces 4/1, 268 (2012).

Uwagi

EN

1. This publication was financed by the Ministry of Science and Higher Education of Poland as the statutory financial grant of the Faculty of Mechanical Engineering SUT.

PL

2. Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2018).