Temperature field analysis of optical coatings induced by millisecond and nanosecond lasers

• Autorzy: Wang B , Qin Y , Ni X , Shen Z , Lu J , Wang X
• Języki publikacji: EN

Abstrakty

EN

To study the differences between long-pulse and short-pulse laser-induced damage in optical dielectric thin films, temperature distributions in single-layer HfO2 films, multi-layer HfO2/SiO2 films, and HfO2 films with high-absorptive inclusions induced by 1 ms and 10 ns lasers are analyzed based on the temperature field theory. Through our calculations, the damage property differences between millisecond and nanosecond lasers are summarized. The results for single-layer films show that 1 ms laser is easier to damage the substrate than 10 ns laser. For multi-layer films, the laser field effect is weaker when irradiating by 1 ms laser. Furthermore, when inclusions are introduced, the film is easier to be damaged by 10 ns laser, which means that 10 ns laser is more sensitive to the inclusions.

Słowa kluczowe

EN

laser damage; thin films; thermal effects

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2012
• Tom: Vol. 42, nr 4
• Strony: 783--793
• Opis fizyczny: Bibliogr. 23 poz., rys., tab., wykr.

Twórcy

autor

Wang B

• School of Science, Nanjing University of Science and Technology, Nanjing 210094, China

autor

Qin Y

autor

Ni X

autor

Shen Z

autor

Lu J

autor

Wang X

Bibliografia

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