The impact of the light exposure on the morphological properties of selected photoresists

• Autorzy: Sikora Andrzej , Janus Paweł , Sierakowski Andrzej

Identyfikatory

DOI

10.5277/oa190116

• Języki publikacji: EN

Abstrakty

EN

In this paper we present the investigation aimed at the photoresist roughness change determination as a reliable estimator of the exposition rate in the processing verification in semiconductor industry. By employing atomic force microscopy as the 3D high resolution surface imaging tool, we tested twelve popular photoresists in terms of the morphological properties changes, while the following radiation doses were applied. Basing on high precision, and repetitive sample positioning, it was possible to perform the tests with high degree of confidence and observe the roughness change dynamics. Various profiles of roughness changes were observed, showing the need for individual study of each material. Moreover, it was possible to select the photoresists which due to poor homogeneity and small roughness changes are not suitable to such a verification. According to our knowledge, no such study was performed so far.

Słowa kluczowe

EN

photolitography; polymer degradation; atomic force microscopy

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2019
• Tom: Vol. 49, nr 1
• Strony: 177--185
• Opis fizyczny: Bibliogr. 12 poz., rys., tab.

Twórcy

autor

Sikora Andrzej

• Electrotechnical Institute, Division of Electrotechnology and Materials Science, ul. M. Skłodowskiej-Curie 55/61, 50-369 Wrocław, Poland

autor

Janus Paweł

• Instytut Technologii Elektronowej, al. Lotników 32/46, 02-669 Warszawa, Poland

autor

Sierakowski Andrzej

• Instytut Technologii Elektronowej, al. Lotników 32/46, 02-669 Warszawa, Poland

Bibliografia

• [1] SIERAKOWSKI A., JANUS P., KOPIEC D., NIERADKA K., DOMANSKI K., GRABIEC P., GOTSZALK T., Optimization method of photolithography process by means of atomic force microscopy, Proceedings of SPIE 8352, 2012, article ID 83520B, DOI: 10.1117/12.918024.
• [2] INDYKIEWICZ K., Zastosowanie litografii elektronowej do wytwarzania tranzystora AlGaN/GaN HEMT, PhD Thesis, Wrocław University of Science and Technology, Poland 2018 (in Polish).
• [3] SIKORA A., BEDNARZ Ł., FAŁAT T., WAŁECKI M., ADAMOWSKA M., Investigation of the impact of simulated solar radiation on the micro- and nanoscale morphology and mechanical properties of a sheet moulded composite surface, Materials Science-Poland 34(3), 2016, pp. 641–649, DOI: 10.1515/msp-2016-0080.
• [4] SIKORA A., GRABAREK A., MOROŃ L., WAŁECKI M., KRYLA P., The investigation of the light radiation caused polyethylene based materials deterioration by means of atomic force microscopy, IOP Conference Series: Materials Science and Engineering 113, 2016, article ID 012016, DOI: 10.1088/ 1757-899X/113/1/012016.
• [5] SIKORA A., The new approach to the investigation of the roughness changes of the non-uniform materials irradiated with UV light and imaged by means of atomic force microscopy supported with precise repetitive scanning area positioning, Measurement Science and Technology 28(3), 2017, article ID 034016, DOI: 10.1088/1361-6501/28/3/034016.
• [6] SIKORA A., High accuracy and sensitivity method of the observation of the surface’s morphology changes by means of atomic force microscopy with cyclic, precise sample positioning, Nanoscience and Nanometrology 3(1) 2017, pp. 6–11, DOI: 10.11648/j.nsnm.20170301.12.
• [7] SIKORA A., MOCZAŁA M., BOHAREWICZ B., Utilization of the precision samples positioning for the AFM assessment of the polystyrene/PC61BM nanocomposite surface degradation, Materials Science -Poland, in print.
• [8] SURESH B., MARUTHAMUTHU S., KHARE A., PALANISAMY N., MURALIDHARAN V.S., RAGUNATHAN R., KANNAN M., PANDIYARAJ K.N., Influence of thermal oxidation on surface and thermo-mechanical properties of polyethylene, Journal of Polymer Research 18(6), 2011, pp. 2175–2184, DOI: 10.1007/ s10965-011-9628-0.
• [9] MIKŠOVÁ R., MACKOVÁ A., MALINSKÝ P., SLEPIČKA P., ŠVORČÍK V., A study of the degradation of polymers irradiated by Cn+ and On+ 9.6 MeV heavy ions, Polymer Degradation and Stability 122, 2015, pp. 110–121, DOI: 10.1016/j.polymdegradstab.2015.10.017.
• [10] NOWICKI M., RICHTER A., WOLF B., KACZMAREK H., Nanoscale mechanical properties of polymers irradiated by UV, Polymer 44(21), 2003, pp. 6599–6606, DOI: 10.1016/S0032-3861(03)00729-8.
• [11] HUAIXI WANG, HUIMIN XIE, ZHENXING HU, DAN WU, PENGWAN CHEN, The influence of UV radiation and moisture on the mechanical properties and micro-structure of single Kevlar fibre using optical methods, Polymer Degradation and Stability 97(9), 2012, pp. 1755–1761, DOI: 10.1016/j.polymdegradstab.2012.06.010.
• [12] https://www.imagemet.com/ (accessed 01.06.2018).

Uwagi

PL

Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2019).