PL EN


Preferencje help
Widoczny [Schowaj] Abstrakt
Liczba wyników
Tytuł artykułu

Structural and electrical properties of barium titanate (BaTiO3) thin films obtained by spray pyrolysis method

Identyfikatory
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
Barium titanate (BaTiO3) thin films have been prepared using the spray pyrolysis method. The films were deposited onto a glass substrate at varying substrate temperature ranging from 250 to 350 degrees C with the interval of 50 degrees C. The structural, morphological, electrical and dielectric properties of the deposited films have been studied. The X-ray diffraction pattern confirmed the polycrystalline nature of the films with a cubic crystal structure. X-ray photoelectron spectroscopy (XPS) showed a good agreement of the thin films stoichiometry with (BaTiO3). A presence of Ba, Ti and O in the BaTiO3 thin films was observed by energy dispersive X-ray analysis. The scanning electron microscopy (SEM) showed the heterogeneous distribution of cubical grains all over the substrate. The grain size decreased with an increase in substrate temperature. The dielectric constant and dielectric loss showed the dispersion behaviour as a function of frequency, measured in the frequency range of 20 Hz to 1 MHz. The AC conductivity (sigma(ac)) measurement showed the linear nature of obtained films, which confirms conduction mechanism due to small polarons. Impedance spectroscopy has been used to study the electrical behaviour of BaTiO3 ferroelectric thin films. The ferroelectric hysteresis loop has been recorded at room temperature.
Wydawca
Rocznik
Strony
852--861
Opis fizyczny
Bibliogr. 39 poz., rys., tab.
Twórcy
  • Shivaji Univ, Dept Phys, Electrochem Mat Lab, Kolhapur 416004, Maharashtra, India.
  • Shivaji Univ, Dept Phys, Electrochem Mat Lab, Kolhapur 416004, Maharashtra, India.
  • Shivaji Univ, Dept Phys, Electrochem Mat Lab, Kolhapur 416004, Maharashtra, India.
autor
  • Shivaji Univ, Dept Phys, Electrochem Mat Lab, Kolhapur 416004, Maharashtra, India.
autor
  • Shivaji Univ, Dept Phys, Electrochem Mat Lab, Kolhapur 416004, Maharashtra, India.
  • Shivaji Univ, Dept Phys, Electrochem Mat Lab, Kolhapur 416004, Maharashtra, India.
  • Shivaji Univ, Dept Phys, Electrochem Mat Lab, Kolhapur 416004, Maharashtra, India.
  • Shivaji Univ, Dept Phys, Electrochem Mat Lab, Kolhapur 416004, Maharashtra, India.
Bibliografia
  • [1] JOMNI F., GONON P., KAMEL F.E., YANGUI B., Integr. Ferroelectr., 97 (2008), 121.
  • [2] ZHU W., WANG C.C., AKBAR S.A., ASIAIE R., J. Mater. Sci., 32 (1997), 4303.
  • [3] KIM S., KWON O.Y., J. Mater. Sci., 34 (1999), 707.
  • [4] WEI Z., NODA M., Integr. Ferroelectr., 52 (2010), 111.
  • [5] LUO W.B., ZHU J., Integr. Ferroelectr., 406 (2010), 56.
  • [6] OSUMI T., NISHIDE M., Integr. Ferroelectr., 133 (2012), 42.
  • [7] XU T., WANG J., SHIMADA T., J. Phys.-Condens. Mat., 25 (2013), 415901.
  • [8] HAN X.Q., KAM C.H., Integr. Ferroelectr., 33 (2001), 221.
  • [9] SUZUKI T., NISHI Y., FUJIMOTO M., Philos. Mag. A, 79 (1999), 2461.
  • [10] PONTES F.M., PINHEIRO C.D., J. Lumin., 104 (2003), 175.
  • [11] YOKOTA K., MORIGOU H., MIYASHITA F., Nucl. Instrum. Meth. B, 257 (2007), 468.
  • [12] MISRA M., KOTANI K., Appl. Surf. Sci., 237 (2004), 421.
  • [13] SILVAN M.M., COBAS L.F., PALMA R.J.M., VELEZ M.H., DUART J.M.M., Surf. Coat. Tech., 151 (2002), 118.
  • [14] HSI C.S., SHIAO F.Y., WU N.C., WANG M.C., Solid State Commun., 125 (2003), 633.
  • [15] TAN C.K., GOH G.K.L., LAU G.K., Thin Solid Films, 516 (2008), 5545.
  • [16] KUMARI S., TRIPATHI C., SINGH A.P., CHAUHAN D., SHRIVASTAV R., DASS S., SATSANGI V.R., Curr. Sci. India, 91 (2006), 1062.
  • [17] PANDA B., DHAR A., NIGAM G.D., BHATTACHARYA D., RAY S. K., Thin Solid Films, 332 (1998), 46.
  • [18] WANG J., WAN H., LIN Q., Mater. Sci. Tech.-Lond., 14 (2003), 172.
  • [19] JAMES A.R., PRAKASH C., PRASAD G., J. Phys. D Appl. Phys., 39 (2006), 1635.
  • [20] QIAO L., BI X., J. Phys. D Appl. Phys., 42 (2009), 1755081.
  • [21] GOLEGO N., STUDENIKIN S.A., COCIVERA M., Chem. Mater., 10 (1998), 2000.
  • [22] SHINDE P.S., SADALE S.B., Sol. Energ. Mat. Sol. C., 92 (2008), 283.
  • [23] SHINDE S.S., BHOSALE C.H., J. Photoch. Photobio. B, 120 (2013), 1.
  • [24] MAHADIK M.A., SHINDE S.S., Mater. Res. Bull., 48 (2013), 4058.
  • [25] SAPKAL R.T., SHINDE S.S., J. Photoch. Photobio. B, 110 (2012), 15.
  • [26] ZARATE R.A., CABRERA A.L., J. Phys. Chem. Solids, 59 (1998), 1639.
  • [27] TRIPATHI A.K., CHARIAR V., GOEL T.C., PILLAI P.K.C., Mater. Sci. Eng. B-Adv., 25 (1994), 34.
  • [28] HWANG U.Y., PARK H.S., KOO K.K., Ind. Eng. Chem. Res., 43 (2004), 728.
  • [29] PHULE P.P., RISBUD S.H., Mater. Sci. Eng. B-Adv., 3 (1989), 241.
  • [30] HONG H., MENG H., KUN Z., FANG T., BIN L., JUAN J., HAO C., LIANG Z., QI L., ZHEN Y., Chinese Phys. Lett., 22 (2005), 2950.
  • [31] LV H., MA L., ZENG P., KE D., PENG T., J. Mater. Chem., 20 (2010), 3665.
  • [32] LEE S., KANG K.Y., HAN S.K., Appl. Phys. Let., 75 (1999), 1784.
  • [33] KANAMADI C.M., KULKARNI S.R., Mater. Chem. Phys., 116 (2009), 6.
  • [34] BAMMANNAVAR B.K., NAIK L.R., CHOUGULE B.K., J. Appl. Phys., 104 (2008), 0641231.
  • [35] WU J., WANG J., J. Appl. Phys., 110 (2011), 064104.
  • [36] PATIL D.R., LOKARE S.A., Mater. Chem. Phys., 104 (2007), 254.
  • [37] DUBEY A.K., SINGH P., SINGH S., KUMAR D., PARKASH O., J. Alloy. Compd., 509 (2011), 3899.
  • [38] JO J.Y., KIM Y.S., KIM D.H., KIM J.D., CHANG Y.J., KONG J.H., PARK Y.D., SONG T.K., YOON J.G., JUNG J.S., NOH T.W., Thin Solid Films, 486 (2005), 149.
  • [39] VIJATOVIC M.M., BOBIC J.D., STOJANOVIC B.D., Sci. Sinter., 40 (2008), 155.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-96eb0b5d-d702-403f-b6ec-1359624a57ed
JavaScript jest wyłączony w Twojej przeglądarce internetowej. Włącz go, a następnie odśwież stronę, aby móc w pełni z niej korzystać.