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Optimised magnetron sputtering method for the deposition of indium tin oxide layers

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Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
The article presents the method of magnetron sputtering for the deposition of conductive emitter coatings in semiconductor structures. The layers were applied to a silicon substrate. For optical investigations, borosilicate glasses were used. The obtained layers were subjected to both optical and electrical characterisation, as well as structural investigations. The layers on silicon substrates were tested with the four-point probe to find the dependence of resistivity on the layer thickness. The analysis of the elemental composition of the layer was conducted using a scanning electron microscope equipped with an EDS system. The morphology of the layers was examined with the atomic force microscope (AFM) of the scanning electron microscope (SEM) and the structures with the use of X-ray diffraction (XRD). The thickness of the manufactured layers was estimated by ellipsometry. The composition was controlled by selecting the target and the conditions of the application, i.e. the composition of the plasma atmosphere and the power of the magnetrons. Based on the obtained results, this article aims to investigate the influence of the manufacturing method and the selected process parameter on the optical properties of thin films, which should be characterised by the highest possible value of the transmission coefficient (>85–90%) and high electrical conductivity.
Rocznik
Strony
art. no. e139005
Opis fizyczny
Bibliogr. 29 poz., fot., tab., wykr.
Twórcy
  • Silesian University of Technology, Welding Department, ul. Konarskiego 18A, 44-100 Gliwice, Poland
  • Faculty of Faculty of Electrical Engineering and Information Technology, Department of Physics, Zilina, Slovakia
autor
  • Institute of Catalysis and Surface Chemistry, Polish Academy of Sciences, ul. Niezapominajek 8, 30-239 Krakow, Poland
  • Institute of Metallurgy and Materials Science PAS, ul. Reymonta 25, 30-059 Krakow, Poland
autor
  • Institute of Metallurgy and Materials Science PAS, ul. Reymonta 25, 30-059 Krakow, Poland
Bibliografia
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  • [3] Y.-S. Cho, M. Han, and S. H. Woo, “Electrospinning of Antimony Doped Tin Oxide Nanoparticle Dispersion for Transparent and Conductive Films,” Arch. Metall. Mater., vol. 65, no. 4, pp. 1345–1350, 2020, doi: 10.24425/amm.2020.133697.
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Uwagi
The article was published as part of a scholarship awarded by the International Visegrad Foundation for the submitted project number 520110061 by Eng. M. Musztyfaga-Staszuk, PhD, DSc.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-921758a5-6a83-4fb7-a44a-3182842a59f2
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