Processing of silicon surface by Nd: YAG laser

• Autorzy: Dobrzański L. A. , Drygała A.
• Języki publikacji: EN

Abstrakty

EN

Purpose: The aim of the paper is to elaborate new method of texturization multicrystalline silicon. The main reason for writing the paper is that most conventional methods used for texturization of monocrystalline silicon are ineffective when applied for texturing multicrystalline silicon. This is consequence of diversified susceptibility of regions of different crystalographic orientation to surface texturization. As a result texture obtained by means of these methods is not uniform. This is the main motivation for conducting this research. Design/methodology/approach: Evaluation of results was performed by laser scanning confocal microscope, scanning electron microscope (SEM), optical microscope. Findings: Laser processing was found to be very promising method in texturization of multicrystalline silicon surface. It appeared to be much more independent on grains crystallographic orientation compared to conventional texturing methods. To sum up, laser texturization of multicrystalline silicon produces texture of higher homogeneity in comparison with chemical and electrochemical methods. Research limitations/implications: The limitation in practical implementation of presented method is related to the possible material damages in the heat affected zone. However it seems to be possible to overcome this inconvenience by removing damages using chemical etching. Practical implications: The research presented in the paper was carried out to incorporate elaborated method into manufacturing process of solar cells of reduced reflectance from the front surface. Success of research is expected to lead to higher efficiency solar cells. Originality/value: The main contribution of the paper is elaboration of method for producing textures of higher homogeneity on the multicrystalline silicon surface. It is significant result from the development of photovoltaics viewpoint where presented method may be successfully used in manufacturing of solar cells of higher efficiency.

Słowa kluczowe

EN

surface treatment; photovoltaics; crystalline silicon; laser processing

PL

obróbka powierzchni; fotowoltaika; krzem krystaliczny; obróbka laserowa

• Wydawca: International OCSCO World Press
• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2006
• Tom: Vol. 17, nr 1-2
• Strony: 321--324
• Opis fizyczny: Bibliogr. 15 poz., rys., wykr.

Twórcy

autor

Dobrzański L. A.

• Division of Materials Processing Technology and Computer Techniques in Materials Science, Institute of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, Poland

autor

Drygała A.

• Division of Materials Processing Technology and Computer Techniques in Materials Science, Institute of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, Poland

Bibliografia

• [1] L.A. Dobrzański, A. Drygała, Surface modification of silicon solar cells, Proceedings of 4th Polish-Ukrainian Scientific Conference, Ukraine, 2006, 45-48 (in Polish).
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• [12] O. Schultz, G. Emanuel, S.W. Glunz, G.P. Willeke, Texturing of multicrystalline silicon with acid wet chemical etching and plasma etching, Proceedings of 3th World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 2003, 118-121.
• [13] W. Sparber, O. Schultz, D. Biro, G. Emanuel, R Preu, A. Poddey, D. Borchert, Comparison of texturing methods for monocrystalline silicon solar cells using KOH and Na2CO3, Proceedings of 3th World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 2003, 122-125.
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