Multi-direction digital moving mask method for fabricating continuous microstructures

• Autorzy: Zhang Z , Gao Y , Luo N , Zhong K , Liu Z

Identyfikatory

DOI

10.5277/oa150108

• Języki publikacji: EN

Abstrakty

EN

The multi-direction digital moving mask method, employing the superposition of the exposure along various moving directions, is developed for fabricating continuous microstructures. The mask pattern corresponding to each moving direction is determined by projecting the target dose profile in the corresponding moving direction. All the mask patterns are dynamically exposed on the same substrate layer by layer so as to form a 3D profile of the exposure dose. The selection criterion of a quantization number and moving-direction number is discussed. For verification of the multi-direction moving method, experiments are performed to fabricate a square pyramid array and square-based microlens array by moving along two orthogonal directions, and round-based microlens array by moving along six directions.

Słowa kluczowe

EN

multi-direction digital moving mask; superposition; quantization

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2015
• Tom: Vol. 45, nr 1
• Strony: 79--88
• Opis fizyczny: Bibliogr. 15 poz., rys.

Twórcy

autor

Zhang Z

• College of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China
• Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hangkong University, Nanchang 330063, China

autor

Gao Y

• Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hangkong University, Nanchang 330063, China

autor

Luo N

• Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hangkong University, Nanchang 330063, China

autor

Zhong K

• College of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China
• Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hangkong University, Nanchang 330063, China

autor

Liu Z

• Optoelectronics Division, Jiangxi Lianchuang Optoelectronic Technology Co., Ltd., Nanchang, 330096, China

Bibliografia

• [1] REN YANG, SOPER S.A., WANJUN WANG, Microfabrication of pre-aligned fiber bundle couplers using ultraviolet lithography of SU-8, Sensors and Actuators A: Physical 127(1), 2006, pp. 123–130.
• [2] CAIJUN KE, XINJIAN YI, ZHIMOU XU, JIANJUN LAI, Monolithic integration technology between microlens arrays and infrared charge coupled devices, Optics and Laser Technology 37(3), 2005, pp. 239–243
• [3] EITEL S., FANCEY S.J., GAUGGEL H.-P., GULDEN K.H., BACHTOLD W., TAGHIZADEH M.R., Highly uniform vertical-cavity surface-emitting lasers integrated with microlens arrays, IEEE Photonics Technology Letters 12(5), 2000, pp. 459–461.
• [4] CHANGQING YI, CHEUK-WING LI, SHENGLIN JI, MENGSU YANG, Microfluidics technology for manipulation and analysis of biological cells, Analytica Chimica Acta 560(1–2), 2006, pp. 1–23.
• [5] ZHANG X., JIANG X.N., SUN C., Micro-stereolithography of polymeric and ceramic microstructures, Sensors and Actuators A: Physical 77(2), 1999, pp. 149–156.
• [6] CHENG SUN, XIANG ZHANG, The influences of the material properties on ceramic micro-stereolithography, Sensors and Actuators A: Physical 101(3), 2002, pp. 364–370.
• [7] YIQING GAO, TINGZHENG SHEN, JINSONG CHEN, NINGNING LUO, XINMIN QI, QI JIN, Research on high-quality projecting reduction lithography system based on digital mask technique, Optik – International Journal for Light and Electron Optics 116(7), 2005, pp. 303–310.
• [8] YI LU, SHAOCHEN CHEN, Direct write of microlens array using digital projection photopolymerization, Applied Physics Letters 92(4), 2008, article 041109.
• [9] KESSELS M.V., NASSOUR C., GROSSO P., HEGGARTY K., Direct write of optical diffractive elements and planar waveguides with a digital micromirror device based UV photoplotter, Optics Communications 283(15), 2010, pp. 3089–3094.
• [10] XIAOWEI GUO, JINGLEI DU, YONGKANG GUO, CHUNLEI DU, ZHENG CUI, JUN YAO, Simulation of DOE fabrication using DMD-based gray-tone lithography, Microelectronic Engineering 83(4–9), 2006, pp. 1012–1016.
• [11] TOTSU K., FUJISHIRO K., TANAKA S., ESASHI M., Fabrication of three-dimensional microstructure using maskless gray-scale lithography, Sensors and Actuators A: Physical 130–131, 2006, pp. 387–392.
• [12] YIQING GAO, NINGNING LUO, TINGZHENG CHEN, MIN CHEN, Research on digital mask fabrication technique of micro-optical element, Journal of Modern Optics 56(4), 2009, pp. 453–462.
• [13] MANSEUNG SEO, HAERYUNG KIM, Influence of dynamic sub-pixelation on exposure intensity distribution under diffraction effects in spatial light modulation based lithography, Microelectronic Engineering 98, 2012, pp. 125–129
• [14] MANSEUNG SEO, HAERYUNG KIM, Spatial light modulation based 3D lithography with single scan virtual layering, Microelectronic Engineering 88(8), 2011, pp. 2117–2120.
• [15] JUN-GYU HUR, Maskless fabrication of three-dimensional microstructures with high isotropic resolution: practical and theoretical considerations, Applied Optics 50(16), 2011, pp. 2383–2390.