Structure and Electrical Resistivity Dependence of Molybdenum Thin Films Deposited by DC Modulated Pulsed Magnetron Sputtering

• Autorzy: Wicher B. , Chodun R. , Nowakowska-Langier K. , Okrasa S. , Król K. , Minikayev R. , Strzelecki G. , Zdunek K.

Identyfikatory

DOI

10.24425/123809

• Języki publikacji: EN

Abstrakty

EN

This work reports the results of a study of Mo thin films synthesis by DC Pulsed Magnetron Sputtering method (PMS), operating at pulse main frequency of 100 kHz and modulated by the additional modulation frequency, driving in the range of 5-1000 Hz (modulated Pulse Magnetron Sputtering – mPMS). We have studied the influence of mPMS on plasma chemical reactions and mechanisms of layer growth using optical emission spectroscopy technique. Our experiment showed strong influence of mPMS method, on the morphology (scanning electron microscopy), phase composition (X-ray diffractometry) and electric properties (4-point probes method) of nanocrystalline and amorphous Mo films. From the utilitarian point of view, low value of resistivity – 43,2 μΩcm of synthesized Mo films predestines them as back contacts for thin solar cells CIGS. Our results revealed that additional modulation frequency should be considered as an important factor for optimization of films synthesis by means of PMS-based methods.

Słowa kluczowe

EN

magnetron sputtering; modulated pulse magnetron sputtering; plasma&films characterization

• Wydawca: Institute of Metallurgy and Materials Science of Polish Academy of Sciences ; Committee of Materials Engineering and Metallurgy of Polish Academy of Sciences
• Czasopismo: Archives of Metallurgy and Materials
• Rocznik: 2018
• Tom: Vol. 63, iss. 3
• Strony: 1339--1344
• Opis fizyczny: Bibliogr. 23 poz., rys., tab., wykr., wzory

Twórcy

autor

Wicher B.

• Warsaw University of Technology, Faculty of Materials Science and Engineering, 141 Wołoska Str., 02-507 Warsaw, Poland

autor

Chodun R.

• Warsaw University of Technology, Faculty of Materials Science and Engineering, 141 Wołoska Str., 02-507 Warsaw, Poland

autor

Nowakowska-Langier K.

• National Centre for Nuclear Research (NCBJ), 7 A. Soltana Str., 05-400 Otwock, Poland

autor

Okrasa S.

• National Centre for Nuclear Research (NCBJ), 7 A. Soltana Str., 05-400 Otwock, Poland

autor

Król K.

• Institute of Microelectronics and Optoelectronics, 75 Koszykowa Str., 00-662 Warsaw, Poland

autor

Minikayev R.

• Polish Academy of Sciences, Institute of Physics, 32/46 Aleja Lotnikow Str., 02-668 Warsaw, Poland

autor

Strzelecki G.

• National Centre for Nuclear Research (NCBJ), 7 A. Soltana Str., 05-400 Otwock, Poland

autor

Zdunek K.

• Warsaw University of Technology, Faculty of Materials Science and Engineering, 141 Wołoska Str., 02-507 Warsaw, Poland

Bibliografia

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Uwagi

EN

1. This work was supported by the National Science Centre (grant no. 2015/19/D/ST8/01917).

PL

2. Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2018).