A polarization selective beam splitter based on a subwavelength multisubpart profile grating structure

• Autorzy: Xiao Y. , Huang L. , Wu H. , Sun X. , Xiao W. , Duan J.

Identyfikatory

DOI

10.5277/oa160413

• Języki publikacji: EN

Abstrakty

EN

In this study, a polarization selective beam splitter constructed by only a single layer subwavelength multisubpart profile grating is presented. Rigorous coupled-wave analysis is adopted to investigate the properties of the structure. It is shown that for a transverse electric polarized wave, the device demonstrates very high reflectivity (>97%) from 1.46 to 1.58 μm; and for a transverse magnetic polarized wave, at the wavelength of 1.55 μm, it exhibits about 50/50 beam ratio under normal incidence. To evaluate the response of the polarizing beam splitters under variation in structure parameters, we also investigated the fabrication tolerances of the device.

Słowa kluczowe

EN

diffraction and gratings; polarizing beam splitter; PBS; leaky-mode resonance; LMR

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2016
• Tom: Vol. 46, nr 4
• Strony: 665--672
• Opis fizyczny: Bibliogr. 20 poz., rys.

Twórcy

autor

Xiao Y.

• School of Information Engineering, Nanchang Hangkong University, Nanchang 330063, China

autor

Huang L.

• School of Information Engineering, Nanchang Hangkong University, Nanchang 330063, China

autor

Wu H.

• National Engineering Laboratory for Non-destructive Testing and Optoelectronic Sensing Technology and Applications, Key Laboratory of Non-destructive Testing, Ministry of Education, China
• Jiangxi Engineering Laboratory for Optoelectronics Testing Technology, School of Measuring and Optical Engineering, Nanchang Hangkong University, Nanchang 330063, China

autor

Sun X.

• Jiangxi Electric Power Design Institute, Nanchang 330006, China

autor

Xiao W.

• National Engineering Laboratory for Non-destructive Testing and Optoelectronic Sensing Technology and Applications, Key Laboratory of Non-destructive Testing, Ministry of Education, China
• Jiangxi Engineering Laboratory for Optoelectronics Testing Technology, School of Measuring and Optical Engineering, Nanchang Hangkong University, Nanchang 330063, China

autor

Duan J.

• National Engineering Laboratory for Non-destructive Testing and Optoelectronic Sensing Technology and Applications, Key Laboratory of Non-destructive Testing, Ministry of Education, China
• Jiangxi Engineering Laboratory for Optoelectronics Testing Technology, School of Measuring and Optical Engineering, Nanchang Hangkong University, Nanchang 330063, China

Bibliografia

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Uwagi

Opracowanie ze środków MNiSW w ramach umowy 812/P-DUN/2016 na działalność upowszechniającą naukę (zadania 2017).