Identyfikatory
Warianty tytułu
Języki publikacji
Abstrakty
The paper presents the analysis of formation of interfacial layer during deposition of diamond like carbon film (DLC) on the 316L stainless steel by capacitive plasma discharge in the CH4 atmosphere. The structure of the interfacial layer of DLC film was strongly affected by the temperature increase during the initial stages of the process. Initially, thin interfacial layer of 5 nm has been formed. As the temperature had reached 210°C, the second phase of the process was marked by the onset of carbon atoms diffusion into the steel and by the interface thickness increase. Finally, the growth of chromium carbide interface, the upward diffusion of chromium and nickel atoms to film, the etching and the decrease of the DLC film thickness were observed at 233°C. These investigations were carried out ex-situ by spectroscopic ellipsometry, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy.
Słowa kluczowe
Wydawca
Czasopismo
Rocznik
Tom
Strony
2211--2216
Opis fizyczny
Bibliogr. 28 poz., rys., tab., wykr.
Twórcy
autor
- Lodz University of Technology, Institute of materials and Engineering, Stefanowskiego 1/15, 90-924 Lodz, Poland
Bibliografia
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- [2] S. Neuville, A. Matthews, Thin Solid Films 515, 6619-6653 (2007).
- [3] E. Mitura, S. Mitura, P. Niedzielski, Z. Has, R. Wolowiec, A. Jakubowski, J. Szmidt, A. Sokolowska, P. Louda, J. Marciniak, B. Koczy, Diamond and Related Materials 3, 896-898 (1994).
- [4] S. Mitura, A. Mitura, P. Niedzielski, P. Couvrat, Chaos, Solitons and Fractals 10, 2165-2176 (1999).
- [5] W. Okrój, M. Kaminska, L. Klimek, W. Szymanski, B. Walkowiak, Diamond and Related Materials 15, 1535-1539 (2006).
- [6] M. Smietana, W. J. Bock, J. Szmidt, J. Grabarczyk, Diamond and Related Materials 19, 1461-1465 (2010).
- [7] P. C. T. Ha, D. R. McKenzie, M. M. M. Bilek, E. D. Doyle, D. G. McCulloch, P. K. Chu, Surface and Coatings Technology 200, 6405-6408 (2006).
- [8] A. Grill, IBM Journal of Research and Development 43, 147-161 (1999).
- [9] Y. Sun, T. Bell, Wear 253, 689-693 (2002).
- [10] M. Tsujikawa, D. Yoshida, N. Yamauchi, N. Ueda, T. Sone, S. Tanaka, Surface and Coatings Technology 200, 507-511 (2005).
- [11] Y. Sun, Journal of Materials Processing Technology 168, 189-194 (2005).
- [12] Z. Has, S. Mitura, M. Clapa, J. Szmidt, Thin Solid Films 136, 161-166 (1986).
- [13] S. Mitura, Z. Has, V. I. Gorokhovsky, Surface and Coatings Technology 47, 106-112 (1991).
- [14] Guide to Using WVASE 32, J. A. Woollam Co., Inc.
- [15] R. Gago, M. Vinnichenko, H. J. Jager, A. Yu. Belov, I. Jimenez, N. Huang, H. Sun, M. F. Maitz, Physical Review B 72, 014120-1-014120-9 (2005).
- [16] M. Dudek, A. Amassian, O. Zabeida, J.E. Klemberg-Saphieha, L. Martinu, Thin Solid Films 517, 4576-4582 (2009).
- [17] W.C. Oliver, G.M. Pharr, Journal of Materials Research 7, 1564-1583 (1992).
- [18] R. Consiglio, N. Durand, K. F. Badawi, P. Macquart, F. Lerbet, M. Assoul, J. von Stebut, Surface and Coatings Technology 97, 192-199 (1997).
- [19] A. von Keudell, W. Jacob, Journal of Applied Physics 79, 1092-1098 (1996).
- [20] S. Mitura, Journal of Crystal Growth 80, 417-424 (1987).
- [21] A. Guiner, Theorie et Technique de Radiocrystallographie, Dunod, Paris, 1956.
- [22] H. Lipson, N. J. Petch, J. Iron Steel Inst. 142, 95 (1940).
- [23] T. Schwarz-Selinger, A. von Keudell, and W. Jacob, Journal of Applied Physics 86, 3988-3996 (1999).
- [24] A. Kluba, D. Bociaga, M. Dudek, Diamond and Related Materials 19, 533-536 (2010).
- [25] G. Capote, F. L. Freire, Materials Science and Engineering B: Solid-State Materials for Advanced Technology 112, 101-105 (2004).
- [26] M. A. Tamor, W. C. Vassell, Journal of Applied Physics 76, 3823-3830 (1994).
- [27] R. O. Dillon, J. A. Wollam, and V. Katkanant, Physical Review B 29, 3482-3489 (1984).
- [28] H.-C. Tsai, D. B. Bogy, Journal of Vacuum Science and Technology A 5, 3287-3313 (1987).
Uwagi
EN
The author wishes to thank Prof. L. Martinu and Prof. J. Klemberg-Sapieha (École Polytechnique de Montréal) for opportunity to carry out of XRD, ellipsometry and hardness measurements, as well Dr M. Kozanecki (Lodz University of Technology) for Raman measurements and Dr M. Walock (University of Alabama at Birmingham) for XPS measurements.
PL
Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2018).
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-7a2c3796-0c5b-4fc8-a8e3-03ea2669a981