Influence of a back side dielectric mirror on thin film silicon solar cells performance

• Autorzy: Cieslak Krystian , Fave Alain , Lemiti Mustapha

Identyfikatory

DOI

10.5277/oa190113

• Języki publikacji: EN

Abstrakty

EN

Back side p⁺ emitter thin silicon solar cells have been constructed using vapor phase epitaxy. Double porous structure on a c-Si substrate was used as a seed substrate in order to enable active layer separation after vapor phase epitaxy growth. Structure of the back side emitter solar cell was obtained in situ during the epitaxy process. In order to enhance solar cell response to light from a range of 700–1200 nm wavelength, the back side dielectric mirror was developed and optimized by means of a computer simulation and deposited by plasma enhanced chemical vapor deposition. At the same time, a reference sample was fabricated. Comparison of solar cells performance with or without the back side mirror was performed and clearly shows that the quality of solar light conversion into the electricity by means of solar cells, can be improved by using the structure proposed in this article.

Słowa kluczowe

EN

thin film silicon solar cells; back side emitter; back side mirror; vapor phase epitaxy; Bragg mirror; IMD optical properties simulation

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2019
• Tom: Vol. 49, nr 1
• Strony: 151--159
• Opis fizyczny: Bibliogr. 11 poz., rys., tab.

Twórcy

autor

Cieslak Krystian

• Faculty of Environmental Engineering, Lublin University of Technology, ul. Nadbystrzycka 40B 20-618 Lublin, Poland

autor

Fave Alain

• Université de Lyon, Institut des Nanotechnologies de Lyon INL – UMR5270, CNRS, Ecole Centrale de Lyon, INSA Lyon, Villeurbanne, F-69621, France

autor

Lemiti Mustapha

• Université de Lyon, Institut des Nanotechnologies de Lyon INL – UMR5270, CNRS, Ecole Centrale de Lyon, INSA Lyon, Villeurbanne, F-69621, France

Bibliografia

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• [3] XIAOWAN DAI, RUI JIA, GUOYU SU, HENGCHAO SUN, KE TAO, CHAO ZHANG, PENGFEI ZHANG, ZHI JIN, XINYU LIU, The influence of surface structure on diffusion and passivation in multicrystalline silicon solar cells textured by metal assisted chemical etching (MACE) method, Solar Energy Materials and Solar Cells 186, 2018, pp. 42–49, DOI: 10.1016/j.solmat.2018.06.011.
• [4] RUI REN, ZHENG ZHONG, Enhanced light absorption of silicon solar cells with dielectric nanostructured back reflector, Optics Communications 417, 2018, pp. 110–114, DOI: 10.1016/j.optcom.2018.02.051.
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• [8] FAVE A., QUOIZOLA S., KRAIEM J., KAMINSKI A., LEMITI M., LAUGIER A., Comparative study of LPE and VPE silicon thin film on porous sacrificial layer, Thin Solid Films 451–452, 2004, pp. 308–311, DOI: 10.1016/j.tsf.2003.11.055.
• [9] IVANOV I.I., NYCHYPORUK T.V., SKRYSHEVSKY V.A., LEMITI M., Thin silicon solar cells with SiОх /SiNx Bragg mirror rear surface reflector, Semiconductor Physics, Quantum Electronics and Optoelectronics 12(4), 2009, pp. 406–411.
• [10] HEISS W., SCHWARZL T., ROITHER J., SPRINGHOLZ G., AIGLE M., PASCHER H., BIERMANN K., REIMANN K., Epitaxial Bragg mirrors for the mid-infrared and their applications, Progress in Quantum Electronics 25(5–6), 2001, pp. 193–228, DOI: 10.1016/S0079-6727(01)00011-8.
• [11] WINDT D.L., IMD – software for modeling the optical properties of multilayer films, Computers in Physics 12(4), 1998, pp. 360–370, DOI: 10.1063/1.168689

Uwagi

PL

Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2019).