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The optical parameters of TiO2 antireflection coating prepared by atomic layer deposition method for photovoltaic application

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Języki publikacji
EN
Abstrakty
EN
Titanium dioxide thin films have been deposited on silicon wafers substrates by an atomic layer deposition (ALD) method. There optical parameters were investigated by spectroscopic ellipsometry and UV/VIS spectroscopy. A material with a refractive index of 2.41 was obtained. Additionally, in a wide spectral range it was possible to reduce the reflection from the silicon surface below 5%. The Raman spectroscopy method was used for structural characterization of anatase TiO2 thin films. Their uniformity and chemical composition are confirmed by a scanning electron microscope (SEM) energy dispersive spectrometer (EDS).
Słowa kluczowe
Czasopismo
Rocznik
Strony
663--670
Opis fizyczny
Bibliogr. 16 poz., rys., tab.
Twórcy
  • Department of Engineering Materials and Biomaterials, Faculty of Mechanical Engineering, Silesian University of Technology, 18A Konarskiego St, 44-100 Gliwice, Poland
  • Department of Engineering Materials and Biomaterials, Faculty of Mechanical Engineering, Silesian University of Technology, 18A Konarskiego St, 44-100 Gliwice, Poland
Bibliografia
  • [1] LESKELÄ M., RITALA M., Atomic layer deposition (ALD): from precursors to thin film structures, Thin Solid Films 409(1), 2002, pp. 138–146, DOI:10.1016/S0040-6090(02)00117-7.
  • [2] PFEIFFER K., SCHULZ U., TÜNNERMANN A., SZEGHALMI A., Antireflection coatings for strongly curved glass lenses by atomic layer deposition, Coatings 7(8), 2017, article 118, DOI:10.3390/coatings7080118.
  • [3] DRYGAŁA A., DOBRZAŃSKI L.A., SZINDLER M., SZINDLER M.M., PROKOPIUKVEL PROKOPOWICZ M., JONDA E., Influence of laser texturization surface and atomic layer deposition on optical properties of polycrystalline silicon, International Journal of Hydrogen Energy 41(18), 2016, pp. 7563–7567, DOI:10.1016/j.ijhydene.2015.12.180.
  • [4] DOBRZAŃSKI L.A., SZINDLER M., DRYGAŁA A., SZINDLER M.M., Silicon solar cells with Al2O3 antireflection coating, Central European Journal of Physics 12(9), 2014, pp. 666–670, DOI:10.2478/s11534-014-0500-9.
  • [5] DENG C., KI H., Pulsed laser deposition of refractive-index-graded broadband antireflection coatings for silicon solar cells, Solar Energy Materials and Solar Cells 147, 2016, pp. 37–45, DOI:10.1016/j.solmat.2015.11.043.
  • [6] SARKAR S., PRADHAN S.K., Silica-based antireflection coating by glancing angle deposition, Surface Engineering 35(11), 2019, pp. 982–985, DOI:10.1080/02670844.2019.1596578.
  • [7] ZEMAN P., TAKABAYASHI S., Nano-scaled photocatalytic TiO2 thin films prepared by magnetron sputtering, Thin Solid Films 433(1–2), 2003, pp. 57–62, DOI:10.1016/S0040-6090(03)00311-0.
  • [8] KADOSHIMA M., HIRATANI M., SHIMAMOTO Y., TORII K., MIKI H., KIMURA S., NABATAME T., Rutile-type TiO2 thin film for high-k gate insulator, Thin Solid Films 424(2), 2003, pp. 224–228, DOI:10.1016/S0040-6090(02)01105-7.
  • [9] DOBROWOLSKI J.A., POITRAS D., MA P., VAKIL H., ACREE M., Toward perfect antireflection coatings: numerical investigation, Applied Optics 41(16), 2002, pp. 3075–3083, DOI:10.1364/AO.41.003075.
  • [10] POITRAS D., LAROUCHE S., MARTINU L., Design and plasma deposition of dispersion-corrected multi-band rugate filters, Applied Optics 41(25), 2002, pp. 5249–5255, DOI:10.1364/AO.41.005249.
  • [11] SONG C.F., LU M.K., YANG P., XU D., YUAN D.R., Structure and photoluminescence properties of sol–gel TiO2–SiO2 films, Thin Solid Films 413(1–2), 2002, pp. 155–159, DOI:10.1016/S0040-6090(02)00440-6.
  • [12] ZAITSU S., MOTOKOSHI S., JITSUNO T., NAKATSUKA M., YAMANAKA T., Large-area optical coatings with uniform thickness grown by surface chemical reactions for high-power laser applications, Japanese Journal of Applied Physics 41, 2002, pp. 160–165, DOI:10.1143/JJAP.41.160.
  • [13] PORE V., RAHTU A., LESKELÄ M., RITALA M., SAJAVAARA T., KEINONEN J., Atomic layer deposition of photocatalytic TiO2 thin films from titanium tetramethoxide and water, Chemical Vapor Deposition 10(3), 2004, pp. 143–148, DOI:10.1002/cvde.200306289.
  • [14] LAKOMAA E.-L., HAUKKA S., SUNTOLA T., Atomic layer growth of TiO2 on silica, Applied Surface Science 60–61, 1992, pp. 742–748, DOI:10.1016/0169-4332(92)90506-S.
  • [15] RITALA M., LESKELÄ M., NYKÄNEN E., SOININEN P., NIINISTÖ L., Growth of titanium dioxide thin films by atomic layer epitaxy, Thin Solid Films 225(1–2), 1993, pp. 288–295, DOI:10.1016/0040-6090(93)90172-L.
  • [16] KASIKOV A., AARIK J., MANDAR H., MOPPEL M., PARS M., UUSTARE T., Refractive index gradients in TiO2 thin films grown by atomic layer deposition, Journal of Physics D: Applied Physics 39(1), 2006, pp. 54–60, DOI:10.1088/0022-3727/39/1/010.
Uwagi
Opracowanie rekordu ze środków MNiSW, umowa Nr 461252 w ramach programu "Społeczna odpowiedzialność nauki" - moduł: Popularyzacja nauki i promocja sportu (2021).
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-72025ea5-2364-46a9-8c1c-a81f3a7540cf
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