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In this paper investigations of structural and optical properties of nanocrystalline Ti–V oxide thin films are described. The films were deposited onto Corning 7059 glass using a modified reactive magnetron sputtering method. Structural investigations of prepared Ti–V oxides with vanadium addition of 19 at. % revealed amorphous structure, while incorporation of 21 and 23 at. % of vanadium resulted in V2O5 formation with crystallites sizes of 12.7 and 32.4 nm, respectively. All prepared thin films belong to transparent oxide semiconductors due to their high transmission level of ca. 60 – 75 % in the visible light range, and resistivity in the range of 3.3_10 2 – 1.4_105 Wcm. Additionally, wettability and hardness tests were performed in order to evaluate the usefulness of the films for functional coatings.
Wydawca
Czasopismo
Rocznik
Tom
Strony
434--445
Opis fizyczny
Bibliogr. 29 poz., rys., tab., wykr.
Twórcy
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw
autor
- Faculty of Mechanical Engineering, University of Technology and Life Sciences in Bydgoszcz, Kaliskiego 7, 85-796 Bydgoszcz
Bibliografia
- [1] OHTA H., HOSONO H., Mater. Today, 7 (2004), 42.
- [2] HAYASHI Y. et al., Vacuum, 74 (2004), 607.
- [3] GRANQVIST C.G., HULTAKER A., Thin Solid Films, 411 (2002), 1.
- [4] FURUBAYASHI Y. et al., Thin Solid Films, 496 (2006), 157.
- [5] SIERADZKA K., DOMARADZKI J., PROCI´OW E. L., MAZUR M., G´O RNICKA B., KACZMAREK D., Cent. Eur. J. Phys., 9 (2011), 313.
- [6] SIERADZKA K., MAZUR M., WOJCIESZAK D., DOMARADZKI J., KACZMAREK D., PROCI´O W E.L., Thin Solid Films, 520 (2012), 3472.
- [7] GRIGOROV K.G. et al., Surf. Sci., 605 (2011), 775.
- [8] MARTINU L., POITRAS D., J. Vac. Sci. Technol. A, 18 (2000), 2619.
- [9] XI J.-Q. et al., Nat. Photonics, 1 (2007), 176.
- [10] WOJCIESZAK D. et al., Pol. J. Chem. Technol., 14 (3) (2012), 1.
- [11] WOJCIESZAK D., KACZMAREK D., DOMARADZKI J., MAZUR M., Int. J. Photoenergy, (2013), http://dx.doi.org/10.1155/2013/526140
- [12] DOMARADZKI J., BANIEWICZ K., MAZUR M., PASIERBEK M., BERLICKI T., Long-term stability of gasochromic effect in TiO2: (W, Cr, Mo) thin film, IEEE Proceedings of 2011 International Students and Young Scientists Workshop ”Photonics and Microsystems”, Cottbus, Germany, 8 – 10 July 2011, pp. 25 – 30.
- [13] DOMARADZKI J., WOJCIESZAK D., PROCIÓW E., KACZMAREK D., WINIARSKI A., SZADE J., J. Nanosci. Nanotechno., 11 (10) (2011), 8744.
- [14] KACZMAREK D., DOMARADZKI J., BORKOWSKA A., PODHORODECKI A., MISIEWICZ J., SIERADZKA K., Opt. Appl., 37 (4) (2007), 433.
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- [16] DOMARADZKI J., KACZMAREK D., BORKOWSKA A., WOLCYRZ M., PASZKIEWICZ B., Phys. Status Solidi A, 203 (2006), 2215.
- [17] DOMARADZKI J., NITSCH K., PROCIOW E., KACZMAREK D., PASZKIEWICZ B., Solid State Ionics, 176 (2005), 2177.
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- [19] PROCIOW E. L., DOMARADZKI J., KACZMAREK D., BERLICKI T., Polish patent No P382163, 2007.
- [20] KACZMAREK D., PROCI´O W E, DOMARADZKI J., BORKOWSKA A., MIELCAREK W., WOJCIESZAK D., Mat. Sci. Pol., 26 (1) (2008), 113.
- [21] KLUG H.P., ALEXANDER L.E., In: H.P. KLUG, L.E. ALEXANDER (Eds.), X-ray Diffraction Procedures for Polycrystalline and Amorphous Materials, 2nd edition, John Wiley and Sons, New York, 1974, p. 635.
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Typ dokumentu
Bibliografia
Identyfikator YADDA
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