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Development and utilization of the nanomarkers for precise AFM tip positioning in the investigation of the surface morphology change

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Treść / Zawartość
Identyfikatory
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
The investigation of the surface properties changes at micrometer and nanometer scale, due to the presence of various factors such as: temperature, solar radiation or magnetic field, requires suitable diagnostic methods. Atomic force microscopy (AFM) is one of the most popular measurement techniques providing necessary resolution. As complex experiments may require multiple moving of the sample between instruments and AFM, one can find quantitative comparison of the results unreliable when the measurements are performed without precise positioning of investigated surface and different areas are analyzed. In this work, the utilization of the nanoscratching method in terms of development of the nanomarkers set is presented, as the solution for precise positioning of the sample in order to perform the multi-step imaging of small surface area (1 μm×1 μm). Various materials were used to verify the versatility of the developed method. Also, the observation of the influence of the UV radiation on the polycarbonate sample was demonstrated as the example proving the application potential of the approach.
Czasopismo
Rocznik
Strony
163--171
Opis fizyczny
Bibliogr. 19 poz., rys., tab., wykr.
Twórcy
autor
  • Electrotechnical Institute, Division of Electrotechnology and Materials Science, M. Skłodowskiej-Curie 55/61, 50-369 Wrocław, Poland
Bibliografia
  • [1] PN-EN 60068-2-5:2002 standard.
  • [2] PN-EN ISO 4892-2:2009/A1:2009 standard.
  • [3] PN-EN 60068-2-38:2010 standard.
  • [4] PN-EN 60068-2-14:2009 standard.
  • [5] SURESH B., MARUTHAMUTHU S., KHARE A., PALANISAMY N., MURALIDHARAN V.S., RAGUNATHAN R., KANNAN M., NAVANEETHA PANDIYARAJ K., Influence of thermal oxidation on surface and thermo--mechanical properties of polyethylene, Journal of Polymer Research 18(6), 2011, pp. 2175–2184.
  • [6] NOWICKI M., RICHTER A., WOLF B., KACZMAREK H., Nanoscale mechanical properties of polymers irradiated by UV, Polymer 44(21), 2003, pp. 6599–6606.
  • [7] CANETTA E., MONTIEL K., ADYA A.K., Morphological changes in textile fibres exposed to environmental stresses: Atomic force microscopic examination, Forensic Science International 191(1–3), 2009, pp. 6–14.
  • [8] ROBERTSON C., WERTHEIMER M.R., FOURNIER D., LAMARRE L., Study on the morphology of XLPE power cable by means of atomic force microscopy, IEEE Transactions on Dielectrics and Electrical Insulation 3(2), 1996, pp. 283–288.
  • [9] RITTER M., DZIOMBA T., KRANZMANN A., KOENDERS L., A landmark-based 3D calibration strategy for SPM, Measurement Science and Technology 18(2), 2007, pp. 404–414.
  • [10] SANTINACCI L., DJENIZIAN T., SCHMUKI P., Nanoscale patterning of Si(100) surfaces by scratching through the native oxide layer using atomic force microscope, Applied Physics Letters 79(12), 2001, pp. 1882–1884.
  • [11] RAMIĄCZEK-KRASOWSKA M., PRAŻMOWSKA J., LOS K., STAFINIAK A., SZYSZKA A., PASZKIEWICZ R., ORSKI W., TARNOWSKI K., TŁACZAŁA M., Creation of high resolution pattern by nanoscratching, Central European Journal of Physics 9(2), 2011, pp. 404–409.
  • [12] KAKIAGE M., ICHIKAWA T., YAMANOBE T., UEHARA H., SAWAI D., Structure and property gradation from surface to bulk of poly(L-lactic acid)/poly(D-lactic acid) blended films as estimated from nanoscratch tests using scanning probe microscopy, ACS Applied Materials and Interfaces 2(3), 2010, pp. 633–638.
  • [13] TURRI S., TORLAJ L., PICCININI F., LEVI M., Abrasion and nanoscratch in nanostructured epoxy coatings, Journal of Applied Polymer Science 118(3), 2010, pp. 1720–1727.
  • [14] TSENG A.A., SHIRAKASHI J.-I., NISHIMURA S., MIYASHITA K., ZHUANG LI, Nanomachining of permalloy for fabricating nanoscale ferromagnetic structures using atomic force microscopy, Journal of Nanoscience and Nanotechnology 10(1), 2010, pp. 456–466.
  • [15] ZHANG HUA-LI, KUAI JI-CAI, ZHANG FEI-HU, Minimum thickness of cut in nanomachining using atomic force microscopy, 2010 International Conference on E-Product E-Service and E-Entertainment (ICEEE), 2010.
  • [16] JANG K., ISHIBASHI Y., IWATA D., SUGANUMA H., YAMADA T., TAKEMURA Y., Fabrication of ferromagnetic nanoconstriction using atomic force microscopy nanoscratching, Journal of Nanoscience and Nanotechnology 11(12), 2011, pp. 10945–10948.
  • [17] JEN-CHING HUANG, CHIA-LIN LI, JYH-WEI LEE, The study of nanoscratch and nanomachining on hard multilayer thin films using atomic force microscope, Scanning 34(1), 2012, pp. 51–59.
  • [18] http://www.imagemet.com/WebHelp/spip.htm#roughness.htm, accessed 05.05.2012.
  • [19] SIERAKOWSKI A., JANUS P., KOPIEC D., NIERADKA K., DOMANSKI K., GRABIEC P., GOTSZALK T., Optimization method of photolithography process by means of atomic force microscopy, Proceedings of SPIE – The International Society for Optical Engineering 8352, 2012, article 83520B.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-69a5e1f7-c309-429e-a81d-a50b7a587a64
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