Selected plasma nitriding methods usable for the thermo-chemical treatment of aircraft parts

• Autorzy: Grzesiak G. , Zahorski T. , Stypniak M. , Walkowicz J. , Jurczyszyn R.

Identyfikatory

DOI

10.5604/12314005.1130461

• Języki publikacji: EN

Abstrakty

EN

The aim of the work was to review selected methods of plasma nitriding, which according to the authors might he used in the thermo-chemical treatment of aircraft parts. The introduction explains the nitriding process and presents the requirements on the thermo-chemical treatment of aircraft parts. Three methods of plasma nitriding have been described: Direct Current Plasma Nitriding (DCPN), Active Screen Plasma Nitriding (ASPN) and Low Pressure Nitriding in AEGD (Arc Enhanced Glow Discharge) plasma. While describing DCPN plasma nitriding method, authors drew attention to known problems, which occur in this process such as edge effect or hollow cathode effect. The Keller's model, the Marchand's model and the Walkowicz's model of nitriding process, which can be found in the literature, were also presented in this work. Another purpose of this work was to present hypotheses about the transportation of nitrogen during Active Screen Plasma Nitriding process and to show that in this nitriding method, defects typical for Direct Current Plasma Nitriding do not occur. While describing Low Pressure Nitriding in AEGD plasma, authors also presented the model of nitriding mechanism in this process, which shows four nitrogen diffusion paths (physisorption, chemisorption, adsorption ofNj, ion implantation). Examples of layers obtained by applying described nitriding methods were presented. The measurement ofnitrided layers confirmed that it is possible to obtain a layer without E film on the surface.

Słowa kluczowe

EN

plasma nitriding; aircraft part; Direct Current Plasma Nitriding; Low Pressure Nitriding in AEGD plasma; Low Pressure Nitriding in Arc Enhanced Glow Discharge plasma; active screen plasma nitriding

• Wydawca: Łukasiewicz Research Network - Institute of Aviation ; European Science Society of Powertrain and Transport KONES Poland ; Wydawnictwo Instytutu Technicznego Wojsk Lotniczych
• Czasopismo: Journal of KONES
• Rocznik: 2014
• Tom: Vol. 21, No. 4
• Strony: 145--152
• Opis fizyczny: Bibliogr. 16 poz., rys.

Twórcy

autor

Grzesiak G.

• Polish Air Force Academy Department of Aeronautics Faculty Dywizjonu 303 Street 35, 08-521 Dęblin, Poland

autor

Zahorski T.

• Polish Air Force Academy Department of Aeronautics Faculty Dywizjonu 303 Street 35, 08-521 Dęblin, Poland

autor

Stypniak M.

• Technical University of Koszalin Department of Mechanical Engineering Racławicka Street 15-17, 75-620 Koszalin, Poland

autor

Walkowicz J.

• Technical University of Koszalin Department of Mechanical Engineering Racławicka Street 15-17, 75-620 Koszalin, Poland

autor

Jurczyszyn R.

• Technical University of Koszalin Department of Mechanical Engineering Racławicka Street 15-17, 75-620 Koszalin, Poland

Bibliografia

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• [2] Wach, P., Michalski, J., Tacikowski, J., Burdzyński, K., Azotowanie gazowe części lotniczych,Inżynieria powierzchni, Nr 2, s. 12-17, 2013.
• [3] Hubbard, P., Characterization of a Commercial Active Screen Plasma Nitriding System,Thesis, Departament od Applied Physics RMIT University, Australia 2007.
• [4] Walkowicz, J., Fizykochemiczna struktura plazmy a skład chemiczny I fazowy warstw wytwarzanych technikami plazmowej inżynierii powierzchni, Studia i rozprawy, ITE Radom 2003.
• [5] Grzesiak, G., Projekt systemu stabilizacji temperatury podłoży w procesie azotowania plazmowego z aktywnym ekranem (ASPN), Praca inżynierska, Instytut Technologii i Edukacji, Politechnika Koszalińska, Koszalin 2014.
• [6] Jurczyszyn, R., Określenie warunków procesu azotowania plazmowego z aktywnym ekranem (ASPN) dla azotowania elementów wielkogabarytowych, Praca magisterska, Instytut Technologii i Edukacji, Politechnika Koszalińska, Koszalin 2014.
• [7] Stępniak, M., Systemy kształtowania cyrkulacji atmosfery azotującej w urządzeniu do azotowania plazmowego z aktywnym ekranem (ASPN), Praca inżynierska, Instytut Technologii i Edukacji, Politechnika Koszalińska, Koszalin 2013.
• [8] Walkowicz, J., On the mechanisms of diode plasma nitriding in N2-H2 mixtures under DC-pulsed substrate biasing, Surface and Coatings Technology 174-175, 1211-1219,2003.
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• [13] Walkowicz, J., Staśkicwicz, J., Szafirowicz, K, Jakrzewski, D., Grzesiak, G., Stępniak, M., Optimization of the ASPN process to bright nitriding of woodworking tools using the Taguchi approach, Journal of Materials Engineering and Performance 22, 410-420, 2012.
• [14] Zhao, C, Li, C. X., Dong, H., Bell, T., Study on the active screen plasma nitriding and its nitriding mechanism, Surface & Coatings Technology 201, 2320- 2325, 2006.
• [15] Hubbard, P., Dowey, S. J., Partridge, J. G., Doyle, E. D., McCulloch, D. G, Investigation of nitrogen mass transfer within an industrial plasma nitriding system II: Application of biased screen, Surface & Coatings Technology 204, 1151-1157, 2010.
• [16] Marchand, J.L., Ablitzer, D., Gantois, M., Michel, H., Plasma nitriding: an analysis of physico-chemical mechanisms at the plasma/solid interface, Proc. Conf. on Ion Nitriding and Ion Carburizing, Cincinnati, OH, p. 67, 1989.