Deposition and Analysis of DLC Thin Films Obtained on 7075 Aluminum Alloy

• Autorzy: Kuffova M. , Marton M. , Kottfer D. , Rehak F.

Identyfikatory

DOI

10.5604/01.3001.0010.4108

• Języki publikacji: EN

Abstrakty

EN

In this study a-C:H (hydrogenated amorphous carbon) thin films were deposited on the 7075 Al alloy without and with admixture gas (N2) using a DC CVD (direct current chemical vapor deposition) method. The structural and mechanical properties were analyzed using Raman spectroscopy, SEM and nanoindentation. We obtained hardness of a-C:H thin film without and with N2 equal to 27.3 GPa and 21.4 GPa, respectively. Values of the Young’s modulus were equal to 135.5 GPa and 205.2 GPa, respectively.

Słowa kluczowe

EN

a-C:H film; CN film; hardness; Young's modulus; 7075 aluminum alloy

• Wydawca: Wojskowa Akademia Techniczna im. Jarosława Dąbrowskiego
• Czasopismo: Problemy Mechatroniki : uzbrojenie, lotnictwo, inżynieria bezpieczeństwa
• Rocznik: 2017
• Tom: Vol. 8, Nr 3 (29)
• Strony: 33--42
• Opis fizyczny: Bibliogr. 15 poz., il., wykr.

Twórcy

autor

Kuffova M.

• Armed Forces Academy of Gen. M. R. Stefanik, 393 Demänová Street, 031 06 Liptovský Mikuláš 6, Slovak Republic

autor

Marton M.

• Slovak University of Technology in Bratislava, Faculty of Electrical Engineering and Information Technology, 3 Ilkovičova Street, 812 19 Bratislava, Slovak Republic

autor

Kottfer D.

• Technical University in Košice, Faculty of Mechanical Engineering, 9 Letná Street, 042 00 Košice, Slovak Republic

autor

Rehak F.

• Alexander Dubček University in Trenčín, Faculty of Special Technology, 2 Študentská Street, 911 50 Trenčín, Slovak Republic

Bibliografia

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