The Influence of the Bias on Mechanical Properties of a-C:H CVD Thin Films

• Autorzy: Kottfer D. , Marton M. , Kaczmarek Ł. , Kuffova M.

Identyfikatory

DOI

10.5604/01.3001.0011.7176

• Języki publikacji: EN

Abstrakty

EN

In this study a-C:H (hydrogenated amorphous carbon) thin films were deposited on the 7075 Al alloy without an interlayer using a DC CVD (direct current chemical vapor deposition) method with varied negative substrate bias in order to improve the hardness and Young´s modulus. The highest values of films hardness and Young´s modulus were 25.6±3.5 GPa and 140.3±4.6 GPa, respectively. The measured results show a promising potential of the a-C:H coated 7075 Al alloy for low load (up to 10 N) applications.

Słowa kluczowe

EN

mechanics; a-C:H thin film; hardness; Young's modulus; 7075 Al alloy

• Wydawca: Wojskowa Akademia Techniczna im. Jarosława Dąbrowskiego
• Czasopismo: Problemy Mechatroniki : uzbrojenie, lotnictwo, inżynieria bezpieczeństwa
• Rocznik: 2018
• Tom: Vol. 9, Nr 1 (31)
• Strony: 23--30
• Opis fizyczny: Bibliogr. 20 poz., rys., tab.

Twórcy

autor

Kottfer D.

• Technical University in Košice, Faculty of Mechanical Engineering 74 Mäsiarska Str., 040 01 Košice, Slovak Republic

autor

Marton M.

• Slovak University of Technology in Bratislava, Faculty of Electrical Engineering and Information Technology 3 Ilkovičova Str., 812 19 Bratislava, Slovak Republic

autor

Kaczmarek Ł.

• Technical University of Lodz, Faculty of Mechanical Engineering 1/15 Stefanowskiego Str., 90-924 Lodz, Poland

autor

Kuffova M.

• Armed Forces Academy of Gen. M. R. Stefanik 393 Demänová Street, 031 06 Liptovský Mikuláš 6, Slovak Republic

Bibliografia

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Uwagi

1. This work was financially supported by the Slovak Grant Agency under the grant VEGA 1/0432/17.

2. Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2018).