Mitigation scratch on fused silica optics using CO2 laser

• Autorzy: Liu C.-M. , Yan Z.-H. , Yang L. , Jiang Y. , Zu X.-T. , Wang H.-J. , Liao W. , Yuan X.-D. , Zheng W.-G.

Identyfikatory

DOI

10.5277/oa160306

• Języki publikacji: EN

Abstrakty

EN

The scratch on a fused silica surface was treated as a chain of connected damage sites and mitigated one after another using CO₂ laser irradiation. The optical microscopy image shows that a scratch with the width of about 30 μm and length of several millimeters can be completely mitigated without the formation of debris and bubbles. The mitigated scratch can survive under raster scan laser irradiation with the fluency increased up to 11.0J/cm² at 3ns and 351nm. On the contrary, the substrate without CO₂ laser mitigation is seriously damaged under this irradiation. The light modulation induced by mitigation is much smaller when the scratch is mitigated before being damaged. The light modulation is about 2 when the distance to the mitigated sample is larger than 20cm. The birefringence induced by residual stress in the mitigated scratch is measured. The retardance of the mitigated scratch before being damaged is not visible. Therefore, residual stress in this mitigated scratch before being damaged should be not a critical potential risk in laser damage.

Słowa kluczowe

EN

mitigation; scratch; fused silica; CO2 laser

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Optica Applicata
• Rocznik: 2016
• Tom: Vol. 46, nr 3
• Strony: 387--397
• Opis fizyczny: Bibliogr. 29 poz., rys.

Twórcy

autor

Liu C.-M.

• School of Physical Electronics, University of Electronic Science and Technology of China,Chengdu, 610054, China

autor

Yan Z.-H.

• School of Physical Electronics, University of Electronic Science and Technology of China,Chengdu, 610054, China

autor

Yang L.

• School of Physical Electronics, University of Electronic Science and Technology of China,Chengdu, 610054, China

autor

Jiang Y.

• Joint Laboratory for Extremeconditions Matter Properties, Southwest University of Science and Technology, Mianyang, 62101, China

autor

Zu X.-T.

• School of Physical Electronics, University of Electronic Science and Technology of China,Chengdu, 610054, China

autor

Wang H.-J.

• Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, China

autor

Liao W.

• Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, China

autor

Yuan X.-D.

• Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, China

autor

Zheng W.-G.

• Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, China

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Uwagi

Opracowanie ze środków MNiSW w ramach umowy 812/P-DUN/2016 na działalność upowszechniającą naukę.