Effect of nitrogen flow rate on properties of CrN films Prepared by HCD-gun

• Autorzy: Novinrooz A. J. , Seyedi H.
• Języki publikacji: EN

Abstrakty

EN

Purpose: The effect of reactant nitrogen gas flow rate on the tribological properties of CrN thin films was studied. Design/methodology/approach: Hollow Cathode Discharge gun (HCD-gun) was employed for the coating of CrN films on the glass and SS-316 sub strum. The reactant nitrogen with different flow was fed in to the vacuum chamber of 3x10-3 Pa pressure to form Cr N composite under experimental condition. Findings: The crystalline phase and micro structural studies of the specimens were carried out by XRD and SEM respectively. It was found that the preferred orientation for CrN films was (200) and that for Cr2N was (111). The micro hardness measurement fulfilled by Vickers test, and the hardness value obtained was 2100kgm-2. The glow discharge optical emission spectroscopy (GDOES) was used for compositional analysis of the content elements. The wear resistance test was performed under specific condition. Research limitations/implications: We have completed our discussion by commenting the results on small deposition area, and therefore, we endeavor further attempt on large area coating. Practical implications: The Cr-N composite due to higher hardness, wear resistance and anticorrosion characteristics is widely used in cutting tools, aerospace and industrial fields. Originality/value: It may be remarked that the hardness and wear resistance values obtained in this work is very encouraging and therefore makes thin composite suitable in various technical applications.

Słowa kluczowe

EN

chromium nitride; thin layer coating; hollow cathode discharge-gun; micro hardness; wear resistance

PL

azotek chromu; powłoka cienkowarstwowa; mikrotwardość; odporność na zużycie

• Wydawca: International OCSCO World Press
• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2006
• Tom: Vol. 17, nr 1-2
• Strony: 189--192
• Opis fizyczny: Bibliogr. 13 poz., rys., wykr.

Twórcy

autor

Novinrooz A. J.

• Ion Beam Application Division, NRCAM, P.O. Box 31585-4395 Karaj, Iran

autor

Seyedi H.

• Ion Beam Application Division, NRCAM, P.O. Box 31585-4395 Karaj, Iran

Bibliografia

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