The role of magnetic energy on plasma localization during the glow discharge under reduced pressure

• Autorzy: Chodun R. , Nowakowska-Langier K. , Zdunek K. , Okrasa S.

Identyfikatory

DOI

10.1515/nuka-2016-0032

• Konferencja: PLASMA-2015 International Conference on Research and Applications of Plasmas (7-11 September 2015 ; Warsaw, Poland)
• Języki publikacji: EN

Abstrakty

EN

In this work, we present the first results of our research on the synergy of fields, electric and magnetic, in the initiation and development of glow discharge under reduced pressure. In the two-electrode system under reduced pressure, the breakdown voltage characterizes a minimum energy input of the electric field to initiate and sustain the glow discharge. The glow discharge enhanced by the magnetic field applied just above the surface of the cathode influences the breakdown voltage decreasing its value. The idea of the experiment was to verify whether the contribution of potential energy of the magnetic field applied around the cathode is sufficiently effective to locate the plasma of glow discharge to the grounded cathode, which, in fact, is the part of a vacuum chamber wall (the anode is positively biased in this case). In our studies, we used the grounded magnetron unit with positively biased anode in order to achieve favorable conditions for the deposition of thin films on fibrous substrates such as fabrics for metallization, assuming that locally applied magnetic field can effectively locate plasma. The results of our studies (Paschen curve with the participation of the magnetic field) seem to confirm the validity of the research assumption. What is the most spectacular – the glow discharge was initiated between introduced into the chamber anode and the grounded cathode of magnetron ‘assisted’ by the magnetic field (discharge did not include the area of the anode, which is a part of the magnetron construction).

Słowa kluczowe

EN

glow discharge; grounded magnetron; magnetron sputtering

• Wydawca: Institute of Nuclear Chemistry and Technology
• Czasopismo: Nukleonika
• Rocznik: 2016
• Tom: Vol. 61, No. 2
• Strony: 191--194
• Opis fizyczny: Bibliogr. 7 poz., rys.

Twórcy

autor

Chodun R.

• Faculty of Materials Science and Engineering, Warsaw University of Technology, 141 Woloska Str., 02-507 Warsaw, Poland, Tel.: [phone], Fax: [phone]

autor

Nowakowska-Langier K.

• Department of Plasma Physics and Materials Engineering, National Centre for Nuclear Research (NCBJ), 7 Andrzeja Soltana Str., 05-400 Otwock/Swierk, Poland

autor

Zdunek K.

• Faculty of Materials Science and Engineering, Warsaw University of Technology, 141 Woloska Str., 02-507 Warsaw, Poland, Tel.: [phone], Fax: [phone]

autor

Okrasa S.

• Faculty of Materials Science and Engineering, Warsaw University of Technology, 141 Woloska Str., 02-507 Warsaw, Poland, Tel.: [phone], Fax: [phone]

Bibliografia

• 1. Paschen, F. (1889). Ueber die zum Funkenübergang in Luft, Wasserstoff und Kohlensäure bei verschiedenen Drucken erforderliche Potentialdifferenz. Ann. Phys., 273(5), 69–96.
• 2. Dinklage, A., Klinger, T., Marx, G., & Schweikhard, L. (2005). Plasma physics: Confinement, transport and collective effects (Chapter 5.2, pp. 98–100). Lect. Notes Phys. 670. Berlin: Springer.
• 3. Petraconi, G., Maciel, H. S., Pessoa, R. S., Murakami, G., Massi, M., Otani, C., Uruchi, W. M. I., & Sismanoglu, B. N. (2004). Longitudinal magnetic field effect on the electrical breakdown in low pressure gases. Braz. J. Phys., 34(4b), 1662–1666.
• 4. Ledernez, L., Olcaytug, F., & Urban, G. (2012). Paschen curve and fi lm growth in low pressure capacitively coupled magnetron plasma polymerization. Contrib. Plasma Phys., 52(4), 283–288.
• 5. Nunez, Y., Wemans, A., & Gordo, P. R. (2007). Breakdown in planar magnetron discharges of argon on copper. Vacuum, 81(11/12), 1511–1514.
• 6. Posadowski, W. M., Wiatrowski, A., Dora, J., & Radzimski, Z. J. (2008). Magnetron sputtering process control by medium-frequency power supply parameter. Thin Solid Films, 516(14), 4478–4482.
• 7. Andres, A., Andersson, J., & Ehiasarian, A. (2007). High power impulse magnetron sputtering: Current--voltage-time characteristics indicate the onset of sustained self-sputtering. J. Appl. Phys., 102(11), 113303-1-11.

Uwagi

PL

Opracowanie ze środków MNiSW w ramach umowy 812/P-DUN/2016 na działalność upowszechniającą naukę.