Analysis of the impact of post-process modifications on the properties of TiO2 thin films with high-temperature stable anatase phase deposited by the electron beam evaporation method

• Autorzy: Obstarczyk Agata , Mańkowska Ewa , Weichbrodt Wiktoria , Kapuścik Paulina , Kijaszek Wojciech , Mazur Michał

Identyfikatory

DOI

10.24425/opelre.2024.151991

• Języki publikacji: EN

Abstrakty

EN

The paper describes the structural, optical, tribological, and mechanical properties of as‑prepared and annealed titanium dioxide (TiO₂) coatings. TiO₂ films were deposited by the electron beam evaporation (EBE) and additionally annealed at a temperature up to 800 °C using a tubular furnace. X-ray diffraction (XRD) analysis identified the amorphous phase of coatings as-prepared and annealed at 200 °C. The phase transition to anatase occurred at 400 °C, while annealing at 600 °C and 800 °C did not induce a phase transition to the rutile phase. The crystallite size increased with an annealing up to 40.4 nm at 800 °C. Raman spectroscopy confirmed the anatase phase in thin films annealed at 400 °C and above. A scanning electron microscope (SEM) images revealed surface morphology and grain structure changes after post-process high-temperature annealing. The optical transmission measurements showed a redshift in the fundamental absorption edge with increasing annealing temperature, accompanied by a decreased transparency level. The value of an optical band gap energy (Eg^opt) decreased to 2.77 eV for films annealed at 800 °C. Tribological tests revealed reduced scratch resistance with higher annealing temperatures, which was attributed to increased surface roughness and coating removal. Nanoindentation measurements showed a decrease in hardness with annealing temperature, attributed to changes in crystallite size and surface morphology. This comprehensive analysis of TiO₂ thin-film coatings showed that the post-process annealing should be carefully controlled for films used in optoelectronic applications.

Słowa kluczowe

EN

post-process annealing; electron beam evaporation; TiO2; coating; high-temperature stable anatase

• Wydawca: Stowarzyszenie Elektryków Polskich ; Polska Akademia Nauk ; Wojskowa Akademia Techniczna im. Jarosława Dąbrowskiego
• Czasopismo: Opto-Electronics Review
• Rocznik: 2024
• Tom: Vol. 32, No. 4
• Strony: art. no. e151991
• Opis fizyczny: Bibliogr. 53 poz., rys., wykr., tab.

Twórcy

autor

Obstarczyk Agata

• Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland

• https://orcid.org/0000-0002-3759-9702

autor

Mańkowska Ewa

• Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland

• https://orcid.org/0000-0003-3635-6634

autor

Weichbrodt Wiktoria

• Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland

• https://orcid.org/0009-0007-5086-6346

autor

Kapuścik Paulina

• Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland

• https://orcid.org/0009-0001-9150-4380

autor

Kijaszek Wojciech

• Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland

• https://orcid.org/0000-0002-2429-2701

autor

Mazur Michał

• Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland

• https://orcid.org/0000-0002-6997-4204

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