Electro-deposition parameters of boron carbonitride (bcn) from borax pentahydrate (NA2B4O7•5H2O)

• Autorzy: Tufan B. , Batar T.

Identyfikatory

DOI

10.5277/ppmp160112

• Języki publikacji: EN

Abstrakty

EN

The primary objective of this research is the fabrication of boron end products from boron derivatives by electro-deposition as powder or coating. The production of boron carbonitride is achieved by electro-deposition at low temperatures without carbon dioxide emission, regardless of sintering and thermal treatment. The extensive usage of boron is aimed and should be accomplished by application of electro-deposition method for boron carbonitride fabrication.

Słowa kluczowe

EN

electro-deposition; boron carbonitride; borax pentahydrate; low temperature

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Physicochemical Problems of Mineral Processing
• Rocznik: 2016
• Tom: Vol. 52, iss. 1
• Strony: 136--146
• Opis fizyczny: Bibliogr. 22 poz., rys., tab.

Twórcy

autor

Tufan B.

• Dokuz Eylul University, Department of Mining Engineering, 35390, Buca, Izmir

autor

Batar T.

• Gediz University, Department of Mechanical Engineering, Seyrek, Izmir

Bibliografia

• AHN H., KLIMEK K.S., RIE K.T., 2003, BCN coatings by RF PACVD at low temperature, Surface and Coatings Technology, 174-175, 1225-1228.
• AOKI H., TOKUYAMA S., SASADA T., WATANABE D., MAZUMDER M.K., KIMURA C., 2008, Dry etching properties of boron carbon nitride (BCN) films using carbon fluoride gas, Diamond & Related Materials, 17, 1800-1804.
• BLANK V.D., SEEPUJAK A., POLYAKOV E.V., BATOV D.V., KULNITSKIY B.A., PARKHO-MENKO, 2009, Growth and characterization of BNC nanostructures, Carbon, 47, 3167-3174.
• BOSSO J.F., GASECA G.R., 1971, Electro-deposition process, US Patent 3,619,398.
• CHEN C.S., SHIH Y.J., HUANG Y.H., HUANG G.H., 2011, Recovery of nickel with the addition of boric acid using an electro-deposition reactor, Desalination and Water Treatment, 32 (1-3), 345-350.
• EBRAHIMI F., BOURNE G.R., KELLY M.S., MATTHEWS T.E., 1999, Mechanical properties of nanocrystalline nickel produced by electro-deposition, NanoStructured Materials, 11 (3), 343-350.
• ETI MINE, 2003, Pre-feasibility report summaries, Boron nitride planning and data processing department, Ankara.
• ETI MINE, 2012, Activity report, Retrieved December 12, 2013, from http://www.etimaden.gov.tr
• GRIGOREV O.N., BEGA N.D., LYASHENKO V.I., DUBOVIK T.V., PANASHENKO V.M., SHCHERBINA O.D., 2005, Dependence of the structure of sintered boron carbonitride on the defect level in the starting BN powder, Powder Metallurgy and Metal Ceramics, 44, 5-6.
• GUPTA C.K., 2003, Chemical Metallurgy: Principles and Practice, Weinheim: Wiley-Vch, 670-710.
• HUANG F.L., CAO C.B., XIANG X., LV R.T., ZHU H.S., 2004, Synthesis of hexagonal boron carbonitride phase by solvothermal method, Diamond & Related Materials, 13, 1757-1760.
• JAIN A., ANTHONYSAMY S., ANANTHASIVANA K., RANGANATHANA R., MITTAL V., NARASIMHAN S.V., 2008, Characterization of electrodeposited elemental boron, Materials Characterization, 59, 890-900.
• LOU H.H., HUANG Y., 2006, Electroplating, Encyclopedia of Chemical Processing, Taylor & Francis, 1-10.
• MANNAN M.A., NAGANO M., HIRAO N., BABA Y., 2008, Hexagonal BCN Films Prepared by RF Plasma-Enhanced CVD, Chemistry Letter, 37 (1), 96-97.
• NAIK Y.A., VENKATESHA T.V., NAYAK P.V., 2002, Electro-deposition of zinc from chloride solution, Turkish Journal of Chemistry, 26, 725-733.
• TORRES R., CARETTI I., GAGO R., MARTIN Z., JIMENEZ I., 2007, Bonding structure of BCN nano-powders prepared by ball milling, Diamond & Related Materials, 16, 1450-1454.
• TUFAN B., BATAR T., 2014, Production parameters of boron nitride from boric acid by low temperature electro-deposition, Ciencia e Tecnica (ISSN:0254-0223), 29 (10), 24-36.
• ULRICH S., HOLLECK H., LEISTE H., NIEDERBERGER L., NOLD E., SELL K., 2005, Nano scale, multi-functional coatings in the material system B-C-N-H, Surface & Coatings Technology, 200, 7-13.
• WATANABE M.O., ITOH S., MIZUSHIMA K., SASAKI T., 1996, Bonding characterization of BC2N thin films, Applied Physics Letter, 68, 2962-2964.
• WOHLE J., AHN H., RIE K.T., 1999, BCN coatings on polymer substrates by plasma CVD at low temperature, Surface and Coatings Technology, 116-119, 1166-1171.
• ZHI C.Y., BAI X.D., WANG E.G., 2002, Raman characterization of boron carbonitride nano-tubes, Applied Physics Letter, 80, 3590-3592.
• ZHUGE F., YAMANAKA S., 2008, Ternary compound B4CN4 prepared by direct nitridation of B4C, Journal of Alloys and Compounds, 466, 299-303.

Uwagi

Opracowanie ze środków MNiSW w ramach umowy 812/P-DUN/2016 na działalność upowszechniającą nauki