Morphological features in aluminum nitride epilayers prepared by magnetron sputtering

• Autorzy: Stach S. , Dallaeva D. , Talu S. , Kaspar P. , Tomanek P. , Giovanzana S. , Grmela L.

Identyfikatory

DOI

10.1515/msp-2015-0036

• Języki publikacji: EN

Abstrakty

EN

The aim of this study is to characterize the surface topography of aluminum nitride (AlN) epilayers prepared by magnetron sputtering using the surface statistical parameters, according to ISO 25178-2:2012. To understand the effect of temperature on the epilayer structure, the surface topography was investigated through atomic force microscopy (AFM). AFM data and analysis of surface statistical parameters indicated the dependence of morphology of the epilayers on their growth conditions. The surface statistical parameters provide important information about surface texture and are useful for manufacturers in developing AlN thin films with improved surface characteristics. These results are also important for understanding the nanoscale phenomena at the contacts between rough surfaces, such as the area of contact, the interfacial separation, and the adhesive and frictional properties.

Słowa kluczowe

EN

aluminum nitride epilayer; atomic force microscopy (AFM); magnetron sputtering; substrate; surface roughness

• Wydawca: De Gruyter
• Czasopismo: Materials Science Poland
• Rocznik: 2015
• Tom: Vol. 33, No. 1
• Strony: 175--184
• Opis fizyczny: Bibliogr. 51 poz., rys., tab.

Twórcy

autor

Stach S.

• University of Silesia, Faculty of Computer Science and Materials Science, Institute of Informatics, Department of Biomedical Computer Systems, ul. Będzińska 39, 41-205 Sosnowiec, Poland

autor

Dallaeva D.

• Brno University of Technology, Faculty of Electrical Engineering and Communication, Physics Department, Technická 8, 616 00 Brno, Czech Republic

autor

Talu S.

• Technical University of Cluj-Napoca, Faculty of Mechanical Engineering, Department of AET, Discipline of Descriptive Geometry and Engineering Graphics, 103-105 B-dul Muncii St., Cluj-Napoca 400641, Cluj, Romania

autor

Kaspar P.

• Brno University of Technology, Faculty of Electrical Engineering and Communication, Physics Department, Technická 8, 616 00 Brno, Czech Republic

autor

Tomanek P.

• Brno University of Technology, Faculty of Electrical Engineering and Communication, Physics Department, Technická 8, 616 00 Brno, Czech Republic

autor

Giovanzana S.

• University of Milan-Bicocca, 20125 Milano, Italy

autor

Grmela L.

• Brno University of Technology, Faculty of Electrical Engineering and Communication, Physics Department, Technická 8, 616 00 Brno, Czech Republic

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