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Abstrakty
A study on the buffer layer dependence of the film texture, surface roughness, and magnetization reversal process in Co/Pt multilayers prepared by dc magnetron sputtering is presented. Oxidized Si(100) wafer was covered with four different buffers: (A) 10 nm Cu, (B) 5 nm Ta/10 nm Cu, (C) 5 nm Ta/10 nm Cu/5 nm Ta, and (D) 5 nm Ta/10 nm Cu/5 nm Ta/10 nm Cu. The growth of [2 nm Pt/0.5 nm Co]×5/2 nm Pt on top of these buffer layers results in a large variation in the fcc (111) Co/Pt texture and surface morphology. All films have the perpendicular magnetic anisotropy but magnetization reversal process, studied by the magnetooptic Kerr effect (MOKE) and magnetic force spectroscopy (MFM), strongly depends on the buffer used. Observation of magnetic domains evolution under a MOKE microscope allows one to calculate from magnetization relaxation curves average dispersion of energy barriers of the thermal activated magnetization switching process. The application of MFM in external magnetic field allows one to follow the dynamics of direct and indirect magnetization switching procesess up to submicrometer scale.
Słowa kluczowe
Wydawca
Czasopismo
Rocznik
Tom
Strony
839--848
Opis fizyczny
Bibliogr. 13 poz., rys., tab., wykr.
Twórcy
autor
- Department of Electronics, AGH University of Science and Technology, Al. Mickiewicza 30, 30-059 Kraków, Poland
autor
- Department of Electronics, AGH University of Science and Technology, Al. Mickiewicza 30, 30-059 Kraków, Poland
autor
- Department of Electronics, AGH University of Science and Technology, Al. Mickiewicza 30, 30-059 Kraków, Poland
autor
- Department of Electronics, AGH University of Science and Technology, Al. Mickiewicza 30, 30-059 Kraków, Poland
autor
- Department of Electronics, AGH University of Science and Technology, Al. Mickiewicza 30, 30-059 Kraków, Poland
autor
- Institute of Experimental Physics, University of Bialystok, Lipowa 41, 15-424 Bialystok, Poland
autor
- Institute of Experimental Physics, University of Bialystok, Lipowa 41, 15-424 Bialystok, Poland
autor
- VTT Micro and Nanoelectronics, P.O. Box 1000, FI-02044 VTT, Finland
Bibliografia
- [1] ARCIA P.F.,MEINHOLDT A.D.,SUNA A., Appl. Phys. Lett. 47, (1985) 178.
- [2] DEN BROEDER F.J.A., KUIPER D., VAN DE MOSSELAER A.P., HOVING W., Phys. Rev. Lett. 60, (1988) 2769.
- [3] CARCIA P.F., J. Appl. Phys 63, (1988) 5066.
- [4] JEONG J-R.,KIM Y-S.,SHIN S-C.,J. Appl. Phys, 85, (1999) 5762.
- [5] MAAT S.,TAKANO K.,PARKIN S.S.P.,FULLERTON E.E., Phys. Rev. Lett. 87, (2001) 087202.
- [6] HELLWIG O.,MAAT S.,KORTRIGHT J.B.,FULLERTON E.E., Phys. Rev. B 65, (2002) 144418.
- [7] GARCIA F.,CASALI G.,AUFFRET S.,RODMACQ B.,DIENY B., J. Appl. Phys. 91, (2002) 6905.
- [8] SORT J.,RODMACQ B.,AUFFRET S.,DIENY B., Appl. Phys Lett. 83, (2003) 1800.
- [9] VAN DIJKEN S.,MORITZ J.,COEY J.M.D., J. Appl. Phys. 97, (2005) 063907.
- [10] SORT J.,BALTZ V.,GARCIA F.,RODMACQ B.,DIENY B.,Phys. Rev B 71, (2005) 054411.
- [11] KANAK J.,STOBIECKI T.,VAN DIJKEN S., IEEE Trans. Mag., 44 (2008), 238.
- [12] ROMANENS F., PIZZINI S., YOKAICHIYA F., BONFIM M., PENNEC Y., CAMARERO J., VOGEL J., SORT J., GARCIA F.,RODMAQ B.,DIENY B., Phys. Rev. B 72, (2005) 134410.
- [13] CZAPKIEWICZ M., VAN DIJKEN S., STOBIECKI T., RAK R., ZOLADZ M., MIETNIOWSKI P., Phys. Stat. Sol. (c) 3, (2006) 48.
Typ dokumentu
Bibliografia
Identyfikator YADDA
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