The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis

• Autorzy: Chodun R. , Nowakowska-Langier K. , Okrasa S. , Zdunek K.

Identyfikatory

DOI

10.1515/msp-2016-0007

• Języki publikacji: EN

Abstrakty

EN

This work presents the very first results of the application of plasma magnetic filtering achieved by a coil coupled with an electrical circuit of a coaxial accelerator during the synthesis of AlN thin films by use of Impulse Plasma Deposition method (IPD). The uniqueness of this technical solution lies in the fact that the filter is not supplied, controlled and synchronized from any external device. Our solution uses the energy from the electrical circuit of plasma accelerator. The plasma state was described on the basis of OES studies. Estimation of the effects of plasma filtering on the film quality was carried out on the basis of characterization of structure morphology (SEM), phase and chemical composition (vibrational spectroscopy). Our work has shown that the use of the developed magnetic self-filter improved the structure of the AlN coatings synthesized under the condition of impulse plasma, especially by the minimization of the tendency to deposit metallic aluminum droplets and columnar growth.

Słowa kluczowe

EN

IPD method; magnetic filter; nanocrystalline films; thin films

• Wydawca: De Gruyter
• Czasopismo: Materials Science Poland
• Rocznik: 2016
• Tom: Vol. 34, No. 1
• Strony: 126--131
• Opis fizyczny: Bibliogr. 25 poz., rys.

Twórcy

autor

Chodun R.

• Faculty of Materials Science and Engineering, Warsaw University of Technology, Woloska 141, 02-507 Warsaw, Poland

autor

Nowakowska-Langier K.

• National Centre for Nuclear Research (NCBJ), Andrzeja Soltana 7, 05-400 Otwock-Swierk, Poland

autor

Okrasa S.

• Faculty of Materials Science and Engineering, Warsaw University of Technology, Woloska 141, 02-507 Warsaw, Poland

autor

Zdunek K.

• Faculty of Materials Science and Engineering, Warsaw University of Technology, Woloska 141, 02-507 Warsaw, Poland

Bibliografia

• 1. Guo Q., Yoshida A., Jpn. J. Appl. Phys., 33 (1994), 2453.
• 2. Teisseyre H., Perlin P., Suski T., Grzegory I., Porowski S., Jun J., Pietraszko A., Moustakas T. D., J. Appl. Phys., 76 (1994), 2429.
• 3. Yamashita H., Fukui K., Misawa S., Yoshida S., J. Appl. Phys., 50 (1979), 896.
• 4. Slack G.A., Tanzilli R.A., Pohl R.O., Vandersande J.W., J. Phys. Chem. Solids, 48 (1987), 641.
• 5. Chiu K.H., Chen J.H., Chen H.R., Huang R.S., Thin Solid Films, 515 (2007), 4819.
• 6. Yang R.Z., Hsiung C.M., Chen H.H., Wu H.W., Shih M.C., Microwave Optic. Techn. Lett., 50 (2008), 2863.
• 7. Bose S., Mazumder S.K., Solid State Electron., 62 (2011), 5.
• 8. Kelekci O., Tasli P., Cetin S.S., Kasap M., Ozcelik S., Ozbay E., Curr. Appl. Phys., 12 (2012), 1600.
• 9. Iborra E., Olivares J., Clement M., Vergara L., Sanz-Hervás A., Sangrador J., Sensor. Actuat. A-Phys., 115 (2004), 501.
• 10. Belyanin A.F., Bouilov L.L., Zhirnov V.V., Kamenev A.I., Kovalskij K.A., Spitsyn B.V., Diam. Relat. Mater., 8 (1999), 369.
• 11. Qiu J.Z., Hotta Z., Watari K., Mitsuishi K., Yamazaki M., J. Eur. Ceram. Soc., 26 (2006), 385.
• 12. Fischer R.A., Miehr A., Ambacher O., Metzger T., Born E., J. Cryst. Growth, 170 (1997), 139.
• 13. Tanaka Z., Hasebe Z., Inushima T., Sandhu A., Ohoya S., J. Cryst. Growth, 209 (2000), 410.
• 14. Dimitrova V., Manova D., Paskova T., Uzunov T., Ivanov N., Dechev D., Vacuum, 51 (1998), 161.
• 15. Manova D., Dimitrova V., Fukarek W., Karpuzov D., Surf. Coat. Tech., 106 (1998), 205.
• 16. Nowakowska-Langier K., Wierzbiński E., Zdunek K., Kopcewicz M., Vacuum, 77 (2005), 287.
• 17. Nowakowska-Langier K., Chodun R., Nietubyc R., Minikayev R., Zdunek K., Appl. Surf. Sci., 275 (2013), 14.
• 18. Nowakowska-Langier K., Zdunek K., Wierzbinski E., Surf. Coat. Tech., 204 (2010), 2564.
• 19. Anders S., Anders A., Brown I.G., J. Appl. Phys., 74 (1993), 4239.
• 20. Anders A., Surf. Coat. Tech., 120 – 121 (1999), 319.
• 21. Zimmer O., Surf. Coat. Tech., 200 (2005), 440.
• 22. Zdunek K., Surf. Coat. Tech., 201 (2007), 4813.
• 23. Zdunek K., Nowakowska-Langier K., Chodun R., Kupczyk M., Siwak P., Vacuum, 85 (2010), 514.
• 24. Collins A.T., Lightowlers E.C., Dean P.J., Phys. Rev., 158 (1967), 833.
• 25. Anders A., Thin Solid Films, 518 (2010), 4087.

Uwagi

Opracowanie ze środków MNiSW w ramach umowy 812/P-DUN/2016 na działalność upowszechniającą naukę.