Physical Modelling of the Production of an Alloy Vapour Source for the Synthesis of Dielectric Material

• Autorzy: Nadolski M. , Stradomski G. , Zdunek K. , Okrasa S.

Identyfikatory

DOI

10.24425/amm.2019.131115

• Języki publikacji: EN

Abstrakty

EN

The paper reports the results of a physical modelling study of the production of a hypereutectic aluminium alloy to be used formaking an alloy vapour source for operation in the magnetron. Within the study, targets from a hypereutectic aluminium-silicon alloy were made in laboratory conditions. Thus obtained material was subjected to heat treatment, porosity analysis, and the assessment of the microstructure and fitness for being used in the magnetron. The process of melting the hypereutectic Al-Si alloy was carried out at the Department of Foundry of the Czestochowa University of Technology. The investigation into the production of the alloy vapour source for the synthesis of the dielectric material from the hypereutectic aluminium alloy has confirmed.

Słowa kluczowe

EN

aluminum-silicon alloy; magnetron sputtering processes; gravity casting; die casting

• Wydawca: Institute of Metallurgy and Materials Science of Polish Academy of Sciences ; Committee of Materials Engineering and Metallurgy of Polish Academy of Sciences
• Czasopismo: Archives of Metallurgy and Materials
• Rocznik: 2020
• Tom: Vol. 65, iss. 1
• Strony: 201--206
• Opis fizyczny: Bibliogr. 10 poz., fot., rys., tab.

Twórcy

autor

Nadolski M.

• Czestochowa Technical University, Department of Metallurgy and Technology of Metals, Faculty of Production Engineering and Materials Technology, 19 Armii Krajowej Av., 42-200 Częstochowa, Poland

autor

Stradomski G.

• Czestochowa Technical University, Department of Metallurgy and Technology of Metals, Faculty of Production Engineering and Materials Technology, 19 Armii Krajowej Av., 42-200 Częstochowa, Poland

autor

Zdunek K.

• Warsaw University of Technology, Faculty of Materials Science, 141 Wołoska Str., 02-507 Warszawa, Poland

autor

Okrasa S.

• National Centre for Nuclear Research, Department of Plasma and Ion Technologies, 7 Andrzeja Sołtana Str., 05-400 Otwock, Poland

Bibliografia

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• [4] P. J. Kelly, R. D. Arnell, Magnetron sputtering: a review of recent developments and applications, Vacuum 56, 159-172 (2000).
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• [8] M. Jacobs, G. Terwagne, P. Roquiny, F. Bodart, Unbalanced magnetron sputtered Si-Al coatings: plasma conditions and film properties versus sample bias voltage, Surface and Coatings Technology 116-119, 735-741 (1999).
• [9] L. Rebouta, A. Sousa, M. Andritschky, F. Cerqueira, C. J. Tavares, P. Santilli, K. Pischow, Solar selective absorbing coatings based on AlSiN/AlSiON/AlSiOy layers, Applied Surface Science 356, 30, 203-212 (2015).
• [10] G. Terwagne, F. Bodart, Alumnium and silicon determination on Two Si-Al. Sputter targets used for magnetron sputtering, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 158, 1-4, 683-688 (1999)

Uwagi

PL

Opracowanie rekordu ze środków MNiSW, umowa Nr 461252 w ramach programu "Społeczna odpowiedzialność nauki" - moduł: Popularyzacja nauki i promocja sportu (2020).