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In this paper we report on the optical and electrical studies of single GaAs1-xNx epitaxial layers grown on GaAs substrates by means of atmospheric pressure metal organic vapour phase epitaxy (APMOVPE). Three kinds of samples with 1.2 %, 1.6 % and 2.7 % nitrogen content were studied. Optical properties of the layers were investigated with the use of room temperature transmittance and reflectance measurements. Subsequently Schottky Au–GaAs1-xNx contacts were processed and characterized by current-voltage (I-V) and capacitance-voltage (C-V) measurements within 80 – 480 K temperature range. From the I-V and C-V characteristics the ideality factor, series resistance and built-in potential were determined. Obtained diodes can be used for further studies on defects with the use of DLTS method.
Słowa kluczowe
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Czasopismo
Rocznik
Tom
Strony
595--600
Opis fizyczny
Bibliogr. 10 poz., rys., tab., wykr.
Twórcy
autor
- Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, 50-370 Wroclaw, Poland
autor
- Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, 50-370 Wroclaw, Poland
autor
- Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, 50-370 Wroclaw, Poland
autor
- Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, 50-370 Wroclaw, Poland
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
autor
- Institute of Physics, Polish Academy of Science, Al. Lotnikow 32/46, 02-668 Warsaw, Poland
autor
- Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
Bibliografia
- [1] KONDOW M., UOMI K., NIWA A., KITATANI T., WATAHIKI S., YAZAWA Y., Japan. J. Appl. Phys., 35 (1996), 1273.
- [2] NAKAHARA K., KONDOW M., KITATANI T., LALSON M. C., UOMI K., IEEE Photonics Technol. Lett., 10 (1998), 487.
- [3] FRIEDMAN D.J., GEISZ J.F., KURTZ S.R., OLSON J.M., J. Cryst. Growth, 195 (1998), 409.
- [4] KURTZ S. R., MYERS D., OLSONET J. M., Proceedings of 26th IEEE PVSEC, IEEE, New York, 1997, 875.
- [5] SCIANA B. et al., Cryst. Res. Technol., 47 (2012), 313.
- [6] TALIERCIO T. et al., Phys. Rev. B, 69 (2004), 073303.
- [7] ARIEL V., GARBER V., ROSENFELD D., BAHIR G., Appl. Phys. Lett., 66 (1995), 2101.
- [8] RHODERIC E. H., WILIAMS R. H., Metal Semiconductor Contact, 2nd ed., Clarenden, Oxford, 1988.
- [9] SZE S. M., KWOK K. NG, Physics of Semiconductor Devices, 3rd ed., J. Wiley and Sons, Inc., Hoboken, New Jersey, 2007.
- [10] ZHANG Y., MASCARENHAS A., XIN H.P., TU C.W., Phys. Rev. B, 63 (2001), 161303.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-30f4daef-c923-4f1d-bdfc-41db42bd471b