Przegląd metod czyszczenia powierzchni podłoży SiC

• Autorzy: Martychowiec Agnieszka , Kwietniewski Norbert , Sochacki Mariusz

Identyfikatory

DOI

10.15199/48.2019.10.35

Warianty tytułu

EN

A review of SiC surface cleaning methods

• Języki publikacji: PL

Abstrakty

PL

Zapewnienie wysokiego poziomu uzysku produkcyjnego w technologii półprzewodnikowej wymaga opracowania poszczególnych procesów technologicznych wytwarzania przyrządu oraz wysokiej jakości podłoża. Podstawowymi wskaźnikami jakości podłoży półprzewodnikowych jest gęstość określonego rodzaju defektów oraz poziom czystości powierzchni podłoży przed kolejnymi procesami. W niniejszym komunikacie dokonano przeglądu obecnego stanu wiedzy na temat metod przygotowania i czyszczenia powierzchni węglika krzemu.

EN

Fabrication of an efficient, reliable and durable semiconductor device requires not only the development of specific technological processes used during its production, but also a high quality substrate. The quality of the substrate can be determined by the level of contamination of their surfaces and the presence of defects. They can interfere with proper operation or shorten the life of the instruments. This article reviews the current state of knowledge on the methods of preparation and cleaning of silicon carbide surfaces.

Słowa kluczowe

PL

węglik krzemu; SiC; przygotowanie powierzchni SiC; technologia półprzewodnikowa

EN

silicon carbide; SiC; SiC surface preparation; semiconductor technology

• Wydawca: Wydawnictwo SIGMA-NOT
• Czasopismo: Przegląd Elektrotechniczny
• Rocznik: 2019
• Tom: R. 95, nr 10
• Strony: 154--157
• Opis fizyczny: Bibliogr. 48 poz., tab.

Twórcy

autor

Martychowiec Agnieszka

• Politechnika Warszawska, Instytut Mikroelektroniki i Optoelektroniki, ul. Koszykowa 75, 00-662 Warszawa

autor

Kwietniewski Norbert

• Politechnika Warszawska, Instytut Mikroelektroniki i Optoelektroniki, ul. Koszykowa 75, 00-662 Warszawa

autor

Sochacki Mariusz

• Politechnika Warszawska, Instytut Mikroelektroniki i Optoelektroniki, ul. Koszykowa 75, 00-662 Warszawa

Bibliografia

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Uwagi

Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2019).