Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

• Autorzy: Wojcieszak D. , Mazur M. , Indyka J. , Jurkowska A. , Kalisz M. , Domanowski P. , Kaczmarek D. , Domaradzki J.

Identyfikatory

DOI

10.1515/msp-2015-0084

• Języki publikacji: EN

Abstrakty

EN

Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO₂ and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO₂ with rutile structure.

Słowa kluczowe

EN

plasma modulated magnetron sputtering; titanium dioxide; hardness; scratch resistance; optical and structural properties

• Wydawca: De Gruyter
• Czasopismo: Materials Science Poland
• Rocznik: 2015
• Tom: Vol. 33, No. 3
• Strony: 660--668
• Opis fizyczny: Bibliogr. 43 poz., rys., tab.

Twórcy

autor

Wojcieszak D.

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Mazur M.

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Indyka J.

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Jurkowska A.

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Kalisz M.

• Centre for Material Testing and Mechatronics, Motor Transport Institute, Jagiellonska 80, 03-301 Warsaw, Poland

autor

Domanowski P.

• Faculty of Mechanical Engineering, University of Technology and Life Sciences in Bydgoszcz, Kaliskiego 7, 85-796 Bydgoszcz, Poland

autor

Kaczmarek D.

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Domaradzki J.

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

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