Preparation and characterization of SiO2/silane/POSS functional hybrids

• Autorzy: Szwarc-Rzepka K. , Szatkowski T. , Ciesielczyk F. , Jesionowski T.
• Języki publikacji: EN

Abstrakty

EN

Novel SiO2/silane/POSS functional hybrids have been synthesized via an immobilization method. Hybrid materials were obtained through a connection of emulsion silica with defined dispersive and morphological properties with (3-isocyanatepropyl)triethoxysilane and selected mono- or octasubstituted POSS compounds in organic solvent. Modification effectiveness of the obtained SiO2/silane/POSS hybrid systems was confirmed with the use of the Fourier transform infrared spectroscopy (FTIR). In order to determine the influence of bifunctionalization on coverage degree of the selected POSS compounds, elemental analysis (C, H, N contents) was performed. Moreover, parameters of porous structure of the obtained products were determined: BET surface area, total volume and mean size of pores. During analysis the thermal stability of silsesquioxanes cage, unmodified silica support, and hybrid systems have been investigated. For this purpose dispersive and morphological characterization (particle size distribution and TEM images) was performed.

Słowa kluczowe

EN

SiO2/silane/POSS hybrids; silica support; silsesquioxanes cage; bifunctionalization process

• Wydawca: Oficyna Wydawnicza Politechniki Wrocławskiej
• Czasopismo: Physicochemical Problems of Mineral Processing
• Rocznik: 2013
• Tom: Vol. 49, iss. 2
• Strony: 673--687
• Opis fizyczny: Bibliogr. 27 poz., rys., tab.

Twórcy

autor

Szwarc-Rzepka K.

• Poznan University of Technology, Faculty of Chemical Technology, Institute of Chemical Technology and Engineering, M. Sklodowskiej-Curie 2, PL-60-965, Poznan, Poland

autor

Szatkowski T.

• Poznan University of Technology, Faculty of Chemical Technology, Institute of Chemical Technology and Engineering, M. Sklodowskiej-Curie 2, PL-60-965, Poznan, Poland

autor

Ciesielczyk F.

• Poznan University of Technology, Faculty of Chemical Technology, Institute of Chemical Technology and Engineering, M. Sklodowskiej-Curie 2, PL-60-965, Poznan, Poland

autor

Jesionowski T.

• Poznan University of Technology, Faculty of Chemical Technology, Institute of Chemical Technology and Engineering, M. Sklodowskiej-Curie 2, PL-60-965, Poznan, Poland

Bibliografia

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