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Tytuł artykułu

The GdF3/MgF2 bilayer as an antireflective narrow-band ultraviolet filter

Treść / Zawartość
Identyfikatory
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
The effective work of optical systems, applied in advanced optic and optoelectronic devices, requires antireflective coatings. In this work we focus on designing the bilayer system dedicated to work as a narrow-band filter within UV range of electromagnetic spectrum. Such coatings are applied in lasers where reduction in reflection to a small value at any single wavelength is needed. The bilayer system is based on GdF3 and MgF2 used as materials with middle and low refractive index. The multilayers were obtained by thermal evaporation on a highly purified CaF2 substrates. The spectral dispersion of the refractive index of single layers has been determined by ellipsometric measurements. Thicknesses of single layers included in the bilayer system, aimed to work at specific wavelength, have been optimized based on optical characteristics simulation, including experimentally measured values of the refractive indices. During the deposition, layer thickness and deposition rate were controlled with Inficon XTC/2 thickness measuring system. Optical properties of obtained GdF3/MgF2 bilayer systems have been determined based on spectral dependences of reflectance and transmittance measured with the application of a spectrophotometer. The crystal structure and phase composition of the films have been examined by X-ray diffraction. The result of studies revealed that proper optimization of thicknesses of individual layers creating GdF3/MgF2 bilayer systems makes it possible to obtain the antireflective coating for desired wavelength of electromagnetic spectrum. The GdF3/MgF2 antireflective bilayer will be applied as a narrow-band filter for 238 nm irradiation produced by gas-ion/BBO crystal laser.
Słowa kluczowe
Czasopismo
Rocznik
Strony
187--197
Opis fizyczny
Bibliogr. 18 poz., rys.
Twórcy
  • AGH University of Science and Technology, Faculty of Computer Science, Electronics and Telecommunications, Mickiewicza 30, 30-059 Kraków, Poland
autor
  • AGH University of Science and Technology, Faculty of Computer Science, Electronics and Telecommunications, Mickiewicza 30, 30-059 Kraków, Poland
autor
  • Pevin, Piaskowa 55, 31-341 Kraków, Poland
Bibliografia
  • [1] RAUT H.K, GANESH V.A., SREEKUMARAN NAIR A., RAMAKRISHNA S., Anti-reflective coatings: a critical, in depth review, Energy and Environmental Science 4(10), 2011, pp. 3779–3804.
  • [2] SAKHUJA M., JAESUNG SON, HYUNSOO YANG, BHATIA C.S., DANNER A.J., Outdoor performance and durability testing of antireflecting and self-cleaning glass for photovoltaic applications, Solar Energy 110, 2014, pp. 231–238.
  • [3] LONGQIANG YE, YULU ZHANG, XINXIANG ZHANG, TENG HU, RUI JI, BIN DING, BO JIANG, Sol-gel preparation of SiO2/TiO2/SiO2-TiO2 broadband antireflective coating for solar cell cover glass, Solar Energy Materials and Solar Cells 111(), 2013, pp. 160–164.
  • [4] MARSZALEK K., WINKOWSKI P., MALEK A., Deposition and optical properties of the LaF3/HfO2/MgF2 antireflective coatings, Monographs of ITR, 2014, pp. 68–82.
  • [5] BO-HUEI LIAO, CHENG-CHUNG LEE, Antireflection coatings for deep ultraviolet optics deposited by magnetron sputtering from Al targets, Optics Express 19(8), 2011, pp. 7507–7512.
  • [6] TADOKORO N., JAISUPAP K., SUKBUMPERNG A., PANNAKARN S., KHRAIKRATOKE S., JAMNONGPIAN P., IWATA N., Investigation of shrinkage and cracking of ophthalmic lens coating by a cycle test of UV radiation and high humidity, Thin Solid Films 520(12), 2012, pp. 4169–4173.
  • [7] WINKOWSKI P., MARSZAŁEK K.W., Wide band antireflective coatings Al2O3/HfO2/MgF2 for UV region, Proceedings of SPIE 8902, 2013, article 890228.
  • [8] MARSZAŁEK K., JAGLARZ J., SAHRAOUI B., Study of structure and antireflective properties of LaF3 / HfO2/SiO2 and LaF3/HfO2/MgF2 trilayers for UV applications, Optical Materials 39, 2015, pp. 1–7.
  • [9] WILLEY R.R., Practical Design and Production of Optical Thin Films, 2nd Ed., CRC Press, 2002, pp. 205–208.
  • [10] GUERRERO D.J., GIBBONS S., LOWES J., MERCADO R., Anti-reflective coating for multipatterning lithography, Proceedings of SPIE 6923, 2008, article 69230X.
  • [11] FUNG A.C., MANN B.K., EAKIN R.J., SILVESTRE P., WILLIAMS B., MIYAKE J., TAKANO Y., Top antireflective coating process for deep-UV lithography, Proceedings of SPIE 3678, 1999, p. 967.
  • [12] BISCHOFF M., GÄBLER D., KAISER N., CHUVILIN A., KAISER U., TÜNNERMANN A., Optical and structural properties of LaF3 thin films, Applied Optics 47(13), 2008, pp. C157–C161.
  • [13] PELLICORI S.F., COLTON E., Fluoride compounds for IR coatings, Thin Solid Films 209(1), 1992, pp. 109–115.
  • [14] JUE WANG, SCHREIBER H., DAVIS R.W., WHEATON B.R., Structural comparison of GdF3 films grown on CaF2 (111) and SiO2 substrates, Applied Optics 47(23), 2008, pp. 4292–4296.
  • [15] MING-CHUNG LIU, CHENG-CHUNG LEE, BO-HUEI LIAO, KANEKO M., NAKAHIRA K., TAKANO Y., Fluoride antireflection coatings deposited at 193 nm, Applied Optics 47(13), 2008, pp. C214–C218.
  • [16] JINGCHENG JIN, CHUNSHUI JIN, CHUN LI, WENYUAN DENG, SHUN YAO, Influence of substrate temperatures on the properties of GdF3 thin films with quarter-wave thickness in the ultraviolet region, Applied Optics 54(16), 2015, pp. 5117–5122.
  • [17] HILFIKER J.N., BUNGAY C.L., SYNOWICKI R.A.,TIWALD T.E., HERZINGER C.M., JOHS B., PRIBIL G.K., WOOLLAM J.A., Progress in spectroscopic ellipsometry: applications from vacuum ultraviolet to infrared, Journal of Vacuum Science and Technology A 21(4), 2003, pp. 1103–1108.
  • [18] HILFIKER J., Emerging applications of spectroscopic ellipsometry, Glass Coatings 1, 2007, pp. 24–27.
Uwagi
PL
Opracowanie ze środków MNiSW w ramach umowy 812/P-DUN/2016 na działalność upowszechniającą naukę.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-1ce161f2-f556-4bb3-ad02-011a9f8cd44c
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