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Influence of atmosphere composition on the structure and properties of aluminum oxynitride coatings deposited by PLD method

Identyfikatory
Warianty tytułu
PL
Wpływ składu atmosfery na budowę i właściwości powłok z tlenoazotku glinu otrzymanych metodą PLD
Języki publikacji
EN
Abstrakty
EN
This work presents studies on the influence of oxygen content in reaction atmosphere during pulsed laser deposition on the structure and properties of aluminium oxynitride films. The coatings were grown on monocrystalline Si substrates. Aluminium nitride bulk disk was used as a target. The film deposition took place at room temperature and pressure of 0.5 Pa with varying content of oxygen and nitrogen. Thickness and roughness of the coatings were measured by profilometer. The X-ray diffractometer (XRD) was used for phase analysis of the coatings. Chemical composition was evaluated using X-ray microanalysis (EDS) by means of scanning electron microscopy (SEM). The surface topography was examined using an atomic force microscopy (AFM). Hardness of the coatings was measured by means of nanoindentation. Adhesion was evaluated in microscratch tests and the morphology of the residual scratch was characterized by AFM. Results showed that it was possible to obtain coatings composed of oxynitrides with different stoichiometry. Mechanical properties of the obtained coatings, however, were significantly different from those demonstrated by ALON ceramic. The content of oxygen in the coatings had an influence on the decreasing hardness and Young’s modulus and improved adhesion. There was no influence on thickness and roughness but the lowest number of droplets was noticed in the coatings obtained in pure oxygen.
PL
Celem pracy było zbadanie wpływu zawartości tlenu w atmosferze roboczej na budowę i właściwości powłok z tlenoazotku glinu osadzanych metodą pulsacyjnej ablacji laserowej (PLD).
Rocznik
Strony
23--28
Opis fizyczny
Bibliogr. 22 poz., fig., tab.
Twórcy
  • Institute of Materials Science and Engineering, West Pomeranian University of Technology, Szczecin, Poland
  • Institute of Materials Science and Engineering, West Pomeranian University of Technology, Szczecin, Poland
  • Institute of Materials Science and Engineering, West Pomeranian University of Technology, Szczecin, Poland
Bibliografia
  • [1] Liu X. J., Chen F., Zhang F., Zhang H. L., Zhang Z., Wang J., Wang S. W.,Huang Z. R.: Hard transparent AlON ceramic for visible/IR windows. Int.Journal of Refractory Metals and Hard Materials 39 (2013) 38÷43.
  • [2] Xidong W., Fuming W., Wenchao L.: Synthesis , microstructures and propertiesof g-aluminum oxynitride. Materials Science and Engineering A342(2003) 245÷250.
  • [3] Byeon S. S., Wang K., Jung Y. G., Koo B. H.: Characteristic of AlON–Al2O3 coatings on Al6061 alloy by electrolytic plasma processing inaluminate and nitride electrolytes. Surface & Coatings Technology 204(2010) 3196÷3199
  • [4] McCauley J. W.: Aluminum nitride and AlON ceramics, structure andproperties. Encyclopedia of materials: Science and technology (2001)127÷132.
  • [5] McCauley J. W., Patel P., Chenb M., Gilde G., Strassburger E., Paliwal B.,Ramesh K. T., Dandekar D. P.: AlON: A brief history of its emergence andevolution. Journal of the European Ceramic Society 29 (2009) 223÷236.
  • [6] Ish-Shalom M.: Formation of aluminium oxynitride by carbothermal reductionof aluminium oxide in nitrogen. Journal of Materials Science Letters1 (1982) 147÷149.
  • [7] Zhang N., Liang B., Wang X. Y., Kan H. M., Zhu K. W., Zhao X. J.: Thepressureless sintering and mechanical properties of AlON ceramic. MaterialsScience and Engineering 528 (2011) 6259÷6262.
  • [8] Li X., Luo J., Zhou Y.: Spark plasma sintering behavior of AlON ceramicsdoped with different concentrations of Y2O3. Journal of the EuropeanCeramic Society 35 (2015) 2027÷2032.
  • [9] Hartnett T. M., Bernstein S. D., Maguire E. A., Tustison R. W.: Opticalproperties of ALON (aluminum oxynitride). Infrared Physics & Technology39 (1998) 203÷211
  • [10] Goldman L. M., Balasubramanian S., Nagendra N., Smith M.: ALON®optical ceramic transparencies for sensor and armor applications.http://www.surmet.com/technology/alon-optical-ceramics/index.php(04.04.2015).
  • [11] Shan Y., Xu J., Wang G., Sun X., Liu G., Xu J., Li J.: A fast pressurelesssintering method for transparent AlON ceramics by using a bimodal particlesize distribution powder. Ceramics International 41 (2015) 3992÷3998.
  • [12] Poyai A., Bunjongpru W., Klunngien N., Porntheerapat S., Hruanan C.,Sopitpan S., Nukeaw J.: High-dielectric constant AlON prepared by RFgas-timing sputtering for high capacitance density. Materials Science inSemiconductor Processing 11 (2008) 319÷323.
  • [13] Su M., Zhou Y., Wang K., Yang Z., Cao Y., Hong M.: Highly transparentAlON sintered from powder synthesized by direct nitridation. Journal ofthe European Ceramic Society 35 (2015) 1173÷1178.
  • [14] Zheng J., Forslund B.: Carbothermal synthesis of aluminium oxynitride(ALON) powder: Influence of Starting Materials and Synthesis Parameters.Journal of the European Ceramic Society 15 (1995) 1087-1100.
  • [15] Kim Y. W., Park H. C., Lee Y. B., Oh K. D., Stevens R.: Reaction sinteringand microstructural development in the system Al2O3–AlN. Journal of theEuropean Ceramic Society 21 (2001) 2383÷2391.
  • [16] Maghsoudipour A., Bahrevar M. A., Heinrich J. G., Moztarzadeh F.: Reactionsintering of AlN–AlON composites. Journal of the European CeramicSociety 25 (2005) 1067÷1072.
  • [17] McCauley J. W., Corbin N. D.: High temperature reactions and microstructuresin the Al2O3–AlN system. Progress in Nitrogen Ceramics 65(1983) 111÷118.
  • [18] Boey F. Y. C., Song X. L., Gu Z. Y., Tok A.: AlON phase formation ina tape-cast Al2O3/AlN composite. Journal of Materials Processing Technology89-90 (1999) 478÷480.
  • [19] Jędrzejewski R., Piwowarczyk J., Kochmański P., Baranowska J.: Charakterystykapowłok z tlenoazotku glinu osadzanych metodą PED i PLD.Inżynieria Materiałowa 6 (2014) 496÷499.
  • [20] Zabinski J. S., Hu J. J., Bultman J. E., Pierce N. A., Voevodin A. A.: Stoichiometryand characterization of aluminum oxynitride thin films grownby ion-beam-assisted PLD. Thin Solid Films 516 (2008) 6215÷6219.
  • [21] Maghsoudipour A., Moztarzadeh F., Saremi M., Heinrich J. G.: Oxidationbehavior of AlN–Al2O3 composites. Ceramics International 30 (2004)773÷783.
  • [22] Jędrzejewski R., Baranowska J., Bańczerowska P.: Kinetyka wzrostupowłok Al2O3 osadzanych metodą PED i PLD. Inżynieria Materiałowa5 (2013) 463÷466.
Uwagi
Opracowanie ze środków MNiSW w ramach umowy 812/P-DUN/2016 na działalność upowszechniającą naukę.
Typ dokumentu
Bibliografia
Identyfikator YADDA
bwmeta1.element.baztech-18aad8d4-c112-4231-805e-c5e60b8000f1
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