Laser reflectance interferometry system with a 405 nm laser diode for in situ measurements of CVD diamond thickness

• Autorzy: Kraszewski M. , Bogdanowicz R.
• Języki publikacji: EN

Abstrakty

EN

In situ monitoring of the thickness of thin diamond films during technological processes is important because it allows better control of deposition time and deeper understanding of deposition kinetics. One of the widely used techniques is laser reflectance interferometry (LRI) which enables non-contact measurement during CVD deposition. The authors have built a novel LRI system with a 405 nm laser diode which achieves better resolution compared to the systems based on He-Ne lasers, as reported so far. The system was used for in situ monitoring of thin, microcrystalline diamond films deposited on silicon substrate in PA-CVD processes. The thickness of each film was measured by stylus profilometry and spectral reflectance analysis as a reference. The system setup and interferometric signal processing are also presented for evaluating the system parameters, i.e. measurement uncertainty, resolution and the range of measurable film thickness.

Słowa kluczowe

EN

interferometry; thin films; CVD; diamond; in situ measurements

• Wydawca: Komitet Metrologii i Aparatury Naukowej PAN
• Czasopismo: Metrology and Measurement Systems
• Rocznik: 2013
• Tom: Vol. 20, nr 4
• Strony: 543--554
• Opis fizyczny: Bibliogr. 24 poz., rys., tab., wykr., wzory

Twórcy

autor

Kraszewski M.

• Gdansk University of Technology, G.Narutowicza 11/12, 80-233 Gdansk, Poland

autor

Bogdanowicz R.

• Gdansk University of Technology, G.Narutowicza 11/12, 80-233 Gdansk, Poland

Bibliografia

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Uwagi

EN

his work was supported by the Polish National Science Center (NCN) under the Grant No. 2011/03/D/ST7/03541 and by the National Center for Research and Development (NCBiR) under project No. LIDER/20/91/L-2/10