Optical emission spectra of Zn and Bi in pulsed magnetron plasma

• Autorzy: Ziaja J. , Ozimek M.

Warianty tytułu

PL

Spektroskopia emisyjna plazmy zasilanej impulsowo w trakcie magnetronowego rozpylania stopu Zn-Bi

• Języki publikacji: EN

Abstrakty

EN

This study aimed at determining the relations between technological parameters of sputtering process - power discharge, the targetsubstrate distance, working gas pressure and the chemical composition of pulsed magnetron plasma by means of optical spectrophotometry. Planar 0.90Zn-0.10Bi target was sputtered in Ar, O2 and in the atmosphere of the both gases mixture. Optical emission spectra were measured in 200800 nm wavelength range.

PL

Za pomocą spektroskopii optycznej określono korelacje pomiędzy parametrami procesu rozpylania - moc wyładowania, odległość target-podłoże, ciśnienie gazu, a składem chemicznym plazmy magnetronowego wyładowania jarzeniowego. W badaniach zastosowano stop 0,90Zn-0,10Bi. Target rozpylano w atmosferze argonu (Ar), tlenu (O2) oraz mieszaninie obu tych gazów. Widma emisyjne rejestrowano w zakresie długości fal od 200-800 nm.

Słowa kluczowe

EN

magnetron sputtering; optical spectroscopy; emission lines; pulsed plasma

PL

rozpylanie magnetronowe; spektroskopia optyczna; linie emisyjne; plazma zasilana impulsowo

• Wydawca: Wydawnictwo SIGMA-NOT
• Czasopismo: Przegląd Elektrotechniczny
• Rocznik: 2013
• Tom: R. 89, nr 7
• Strony: 324--326
• Opis fizyczny: Bibliogr. 27 poz., wykr.

Twórcy

autor

Ziaja J.

• Wroclaw University of Technology, Institute of Electrical Engineering Fundamentals, Wybrzeze Wyspanskiego 27, 50-370 Wrocław

autor

Ozimek M.

• Electrotechnical Institute Division of Electrotechnology and Materials Science, M. Sklodowskiej-Curie 55/61, 50-369 Wroclaw

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