Influence of magnetron powering mode on various properties of TiO2 thin films

• Autorzy: Wiatrowski A. , Mazur M. , Obstarczyk A. , Kaczmarek D. , Pastuszek R. , Wojcieszak D. , Grobelny M. , Kalisz M.

Identyfikatory

DOI

10.2478/msp-2018-0099

• Języki publikacji: EN

Abstrakty

EN

In this paper, comparative studies on the structural, surface, optical, mechanical and corrosion properties of titanium dioxide (TiO₂) thin films deposited by continuous and sequential magnetron sputtering processes were presented. In case of continuous process, magnetron was continuously supplied with voltage for 90 min. In turn, in sequential process, the voltage was supplied for 1 s alternately with 1 s break, therefore, the total time of the process was extended to 180 min. The TiO₂ thin films were crack free, exhibited good adherence to the substrate and the surface morphology was homogeneous. Structural analysis showed that there were no major differences in the microstructure between coatings deposited in continuous and sequential processes. Both films exhibited nanocrystalline anatase structure with crystallite sizes of ca. 21 nm. Deposited coatings had high transparency in the visible wavelength range. Significant differences were observed in porosity (lower for sequential process), scratch resistance (better for sequential process), mechanical performance, i.e. hardness:elastic modulus ratio (higher for sequential process) and corrosion resistance (better for sequential process).

Słowa kluczowe

EN

titanium alloys; TiO2; sputtering; mechanical properties; structural properties; thin films

• Wydawca: De Gruyter
• Czasopismo: Materials Science Poland
• Rocznik: 2018
• Tom: Vol. 36, No. 4
• Strony: 748--760
• Opis fizyczny: Bibliogr. 54 poz., rys., tab.

Twórcy

autor

Wiatrowski A.

• Wroclaw University of Science and Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Mazur M.

• Wroclaw University of Science and Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Obstarczyk A.

• Wroclaw University of Science and Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Kaczmarek D.

• Wroclaw University of Science and Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Pastuszek R.

• Wroclaw University of Science and Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Wojcieszak D.

• Wroclaw University of Science and Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

autor

Grobelny M.

• Motor Transport Institute, Centre for Material Testing, Jagiellonska 80, 03-301 Warsaw, Poland

autor

Kalisz M.

• Motor Transport Institute, Centre for Material Testing, Jagiellonska 80, 03-301 Warsaw, Poland

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Uwagi

PL

Opracowanie rekordu w ramach umowy 509/P-DUN/2018 ze środków MNiSW przeznaczonych na działalność upowszechniającą naukę (2019).