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2013 | 11 | 2 | 219-225
Tytuł artykułu

The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation

Treść / Zawartość
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Języki publikacji
EN
Abstrakty
EN
This paper presents the methods of fabricating narrow parallel submicrometric stripes in silicon dioxide and a resist layer. The experiments were conducted by two techniques: double patterning lithography and double exposure lithography. In addition to the above mentioned processes, mask translation was applied. For all conducted experiments, chrome masks and a 405 nm line of the high pressure mercury lamp of an MA-56 Mask Aligner System were used. The main aim of the performed tests was to establish the utility and the possible applications of the methods used.
Wydawca

Czasopismo
Rocznik
Tom
11
Numer
2
Strony
219-225
Opis fizyczny
Daty
wydano
2013-02-01
online
2013-02-09
Twórcy
  • Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, ul. Janiszewskiego 11/17, 50 - 372, Wrocław, Poland, kornelia.indykiewicz@pwr.wroc.pl
  • Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, ul. Janiszewskiego 11/17, 50 - 372, Wrocław, Poland
  • Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, ul. Janiszewskiego 11/17, 50 - 372, Wrocław, Poland
Bibliografia
  • [1] R. Doering, Y. Nishi, Handbook of Semiconductor Manufacturing Technology, 2nd edition (CRC Press, Taylor and Francic Group, New York, 2008)
  • [2] W. M. Moreau, Semiconductor Lithography, Principles, practices, and materials, 1st edition (Plenum Press, New York and London, 1988) http://dx.doi.org/10.1007/978-1-4613-0885-0[Crossref]
  • [3] Y. Wei, R. L. Brainard, Advanced Processes for 193-nm Immersion Lithography, 1st edition (SPIE, Bellingham, Washington, 2009) http://dx.doi.org/10.1117/3.820233[Crossref]
  • [4] H. J. Levinson, Principles of Lithography, 3rd edition (SPIE, Bellingham, Washington, 2010)
  • [5] M. Dusa, W. Arnold, A. Pici, ISSM 2005 IEEE International Symposium on Semiconductor Manufacturing, 13–15 Sept. 2005, 177
  • [6] S. Lee. et al., Optical Microlithography XXIProc. of SPIE 6924, 69242A (2008)
Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.-psjd-doi-10_2478_s11534-012-0166-0
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