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2012 | 10 | 4 | 888-897
Tytuł artykułu

Numerical study of the effect of gas flow in low pressure inductively coupled Ar/N2 plasmas

Autorzy
Treść / Zawartość
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
The effect of gas flow in low pressure inductively coupled Ar/N2 plasmas operating at the rf frequency of 13.56 MHz and the total gas pressure of 20 mTorr is studied at the gas flows of 5–700 sccm by coupling the plasma simulation with the calculation of flow dynamics. The gas temperature is 300 K and input power is 300 W. The Ar fractions are varied from 0% to 95%. The species taken into account include electrons, Ar atoms and their excited levels, N2 molecules and their seven different excited levels, N atoms, and Ar+, N+, N2 +, N4 + ions. 51 chemical reactions are considered. It is found that the electron densities increase and electron temperatures decrease with a rise in gas flow rate for the different Ar fractions. The densities of all the plasma species for the different Ar fractions and gas flow rates are obtained. The collisional power losses in plasma discharges are presented and the effect of gas flow is investigated.
Wydawca

Czasopismo
Rocznik
Tom
10
Numer
4
Strony
888-897
Opis fizyczny
Daty
wydano
2012-08-01
online
2012-07-17
Twórcy
autor
  • Keisoku Engineering System Co., Ltd., 1-9-5 Uchikanda, Chiyoda-ku, Tokyo, 101-0047, Japan, tong@kesco.co.jp
Bibliografia
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Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.-psjd-doi-10_2478_s11534-012-0034-y
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