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Czasopismo
2011 | 9 | 2 | 398-403
Tytuł artykułu

Investigation of the influence of low-concentration hydrogen on the surface potential of thin metallic films for sensor applications

Treść / Zawartość
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
In this paper, a study of the influence of hydrogen (concentrations 6 ppm − 1%) on the work function of thin metallic films at moderately elevated temperatures is presented. The work function was measured indirectly by the observation of the surface potential of dedicated test structures using scanning surface potential microscope. Metallic layers with thicknesses of 10, 20, 30, and 50 nm were deposited on semiconductor substrates as well as on a thick gold layer. The investigations were focused on palladium thin films although a comparison to results obtained for platinum layers was also discussed.
Wydawca

Czasopismo
Rocznik
Tom
9
Numer
2
Strony
398-403
Opis fizyczny
Daty
wydano
2011-04-01
online
2011-02-20
Twórcy
  • Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland, Joanna.Prazmowska@pwr.wroc.pl
autor
  • Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland
  • Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland
  • Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland
Bibliografia
  • [1] R. Ramachadran, R.K. Menon, Int. J. Hydrogen Energ. 23, 593 (1998) http://dx.doi.org/10.1016/S0360-3199(97)00112-2[Crossref]
  • [2] R. Duś, E. Nowicka, R. Nowakowski, Acta Phys. Pol. A 114, S–29 (2008)
  • [3] A.T. Pasteur, St.J. Dixon-Warren, Q. Ge, D.A. King, J. Chem. Phys. 106, 8896 (1997) http://dx.doi.org/10.1063/1.473953[Crossref]
  • [4] A.L. Cabrera, R. Aguayo-Soto, Catal. Lett. 45, 79 (1997) http://dx.doi.org/10.1023/A:1019078419537[Crossref]
  • [5] X. Wu, E.S. Yang, IEEE Electr. Device L. 11, 315 (1990) http://dx.doi.org/10.1109/55.56486[Crossref]
  • [6] K. Christmann, G. Eartl, T. Pignet, Surf. Sci. 54, 365 (1976) http://dx.doi.org/10.1016/0039-6028(76)90232-6[Crossref]
  • [7] Y.J. Coutts, Thin Solid Films 7, 77 (1971) http://dx.doi.org/10.1016/0040-6090(71)90028-9[Crossref]
  • [8] Y. Li, Y.T. Cheng, Int. J. Hydrogen Energ. 21, 281 (1996) http://dx.doi.org/10.1016/0360-3199(95)00094-1[Crossref]
  • [9] H. Lüth, In: H. Lüth (Ed.), Solid surfaces, interfaces and thin films (Springer-Verlag, Berlin, Heidelberg, New York, 2001) 499
  • [10] U. Laudahn et al., Appl. Phys. Lett. 74, 647 (1999) http://dx.doi.org/10.1063/1.123028[Crossref]
Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.-psjd-doi-10_2478_s11534-010-0126-5
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