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2011 | 9 | 2 | 392-397
Tytuł artykułu

Influence of hydrogen absorption on stress changes in thin catalytic metal films dedicated for sensors application

Treść / Zawartość
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
In the paper results of investigation of the influence of low concentration hydrogen on stress changes in thin catalytic metal films were discussed. The concentration of H2 was altered from 6 ppm to 1% of hydrogen (6N) in nitrogen (6N). Silicon beams covered with palladium or platinum films of various thicknesses were anchored at one end and their deflection at the other end was measured by atomic force microscope. Stress changes were determined by application of modified Stoney formula and compared with results of computer modelling. The influence of stress caused by hydrogen absorption on the alteration of output characteristics of AIII-N based hydrogen sensors was excluded. The time dependence of stress in metallic films for various hydrogen concentrations indicated dissociation limited mechanism of hydrogen absorption.
Wydawca

Czasopismo
Rocznik
Tom
9
Numer
2
Strony
392-397
Opis fizyczny
Daty
wydano
2011-04-01
online
2011-02-20
Twórcy
  • Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland, Joanna.Prazmowska@pwr.wroc.pl
  • Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland
autor
  • Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland
  • Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland
  • Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland
Bibliografia
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Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.-psjd-doi-10_2478_s11534-010-0118-5
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