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2010 | 8 | 5 | 798-803
Tytuł artykułu

Photovoltaic cells based on nickel phthalocyanine and zinc oxide formed by atomic layer deposition

Treść / Zawartość
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
The introduction of an ultrathin zinc oxide (ZnO) layer formed by the atomic layer deposition (ALD) technique was found to improve the operation parameters of nickel phthalocyanine (NiPc) based photovoltaic cells with a transparent bottom electrode, indium tin oxide (ITO). This improvement is attributed to several reasons, such as I) increase of photovoltaic yield in ITO/p-NiPc/n-ZnO/Al cells incorporating a hybrid heterojunction as compared to single-layer ITO/NiPc/Al cells, II) enhancement of the overall spectral response in the double-layer cells and III) extension of long-term operational stability.
Wydawca

Czasopismo
Rocznik
Tom
8
Numer
5
Strony
798-803
Opis fizyczny
Daty
wydano
2010-10-01
online
2010-07-22
Twórcy
  • Lviv Polytechnic National University, S. Bandera 12, Lviv, 79013, Ukraine
  • Institute for Physics of Microstructure of the Russian Academy of Sciences (IPM RAS), RF 603950, Nizhny Novgorod, GSP-15, Russia, pakhomov@ipm.sci-nnov.ru
autor
  • Lviv Polytechnic National University, S. Bandera 12, Lviv, 79013, Ukraine
  • Lviv Polytechnic National University, S. Bandera 12, Lviv, 79013, Ukraine
  • Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668, Warsaw, Poland
  • Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668, Warsaw, Poland
autor
Bibliografia
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Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.-psjd-doi-10_2478_s11534-009-0159-9
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