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2008 | 6 | 3 | 643-647
Tytuł artykułu

XRD study on the effect of the deposition condition on pulsed laser deposition of ZnO films

Treść / Zawartość
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
Using a pulsed laser deposition (PLD) process on a ZnO target in an oxygen atmosphere, thin films of this material have been deposited on Si(111) substrates. An Nd: YAG pulsed laser with a wavelength of 1064 nm was used as the laser source. The influences of the deposition temperature, laser energy, annealing temperature and focus lens position on the crystallinity of ZnO films were analyzed by X-ray diffraction. The results show that the ZnO thin films obtained at the deposition temperature of 400°C and the laser energy of 250 mJ have the best crystalline quality in our experimental conditions. The ZnO thin films fabricated at substrate temperature 400°C were annealed at the temperatures from 400°C to 800°C in an atmosphere of N2. The results show that crystalline quality has been improved by annealing, the optimum temperature being 600°C. The position of the focusing lens has a strong influence on pulsed laser deposition of the ZnO thin films and the optimum position is 59.5 cm from the target surface for optics with a focal length of 70 cm.
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Wydawca

Czasopismo
Rocznik
Tom
6
Numer
3
Strony
643-647
Opis fizyczny
Daty
wydano
2008-09-01
online
2008-07-17
Twórcy
autor
  • College of Physics and Electronics, Shandong Normal University, Jinan, 250014, P.R. China, byman@sdnu.edu.cn
autor
  • College of Physics and Electronics, Shandong Normal University, Jinan, 250014, P.R. China
autor
  • College of Physics and Electronics, Shandong Normal University, Jinan, 250014, P.R. China
autor
  • College of Physics and Electronics, Shandong Normal University, Jinan, 250014, P.R. China
autor
  • College of Physics and Electronics, Shandong Normal University, Jinan, 250014, P.R. China
Bibliografia
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Typ dokumentu
Bibliografia
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Identyfikator YADDA
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