Patterning of Quantum Dots by Dip-Pen and Polymer Pen Nanolithography

• Autorzy: Soma Biswas , Falko Brinkmann , Michael Hirtz , Harald Fuchs
• Języki publikacji: EN

Abstrakty

EN

We present a direct way of patterning CdSe/ ZnS quantum dots by dip-pen nanolithography and polymer pen lithography. Mixtures of cholesterol and phospholipid 1,2-dioleoyl-sn-glycero-3 phosphocholine serve as biocompatible carrier inks to facilitate the transfer of quantum dots from the tips to the surface during lithography. While dip-pen nanolithography of quantum dots can be used to achieve higher resolution and smaller pattern features (approximately 1 μm), polymer pen lithography is able to address intermediate pattern scales in the low micrometre range. This allows us to combine the advantages of micro contact printing in large area and massive parallel patterning, with the added flexibility in pattern design inherent in the DPN technique.

Słowa kluczowe

EN

Microarrays; Phospholipids; cholesterol; Nanoparticles; Fluorescence microscopy; Atomic forcemicroscopy

• Czasopismo: Nanofabrication
• Rocznik: 2015
• Tom: 2
• Numer: 1

Daty

otrzymano

2014-11-02

zaakceptowano

2015-02-09

online

2015-05-06

Twórcy

autor

Soma Biswas

• Institute of Nanotechnology
  (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
  Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
  Germany
• Laboratory for Bio- and Nano- Instrumentation
  (LBNI), Ecole Polytechnique Federale De Lausanne (EPFL), CH-1015
  Lausanne, Switzerland

autor

Falko Brinkmann

• Institute of Nanotechnology
  (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
  Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
  Germany

autor

Michael Hirtz

• Institute of Nanotechnology
  (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
  Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
  Germany

autor

Harald Fuchs

• Institute of Nanotechnology
  (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
  Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
  Germany

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Identyfikatory

DOI

10.1515/nanofab-2015-0002