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2015 | 2 | 1 |
Tytuł artykułu

Patterning of Quantum Dots by Dip-Pen and Polymer Pen Nanolithography

Treść / Zawartość
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
We present a direct way of patterning CdSe/ ZnS quantum dots by dip-pen nanolithography and polymer pen lithography. Mixtures of cholesterol and phospholipid 1,2-dioleoyl-sn-glycero-3 phosphocholine serve as biocompatible carrier inks to facilitate the transfer of quantum dots from the tips to the surface during lithography. While dip-pen nanolithography of quantum dots can be used to achieve higher resolution and smaller pattern features (approximately 1 μm), polymer pen lithography is able to address intermediate pattern scales in the low micrometre range. This allows us to combine the advantages of micro contact printing in large area and massive parallel patterning, with the added flexibility in pattern design inherent in the DPN technique.
Wydawca
Czasopismo
Rocznik
Tom
2
Numer
1
Opis fizyczny
Daty
otrzymano
2014-11-02
zaakceptowano
2015-02-09
online
2015-05-06
Twórcy
autor
  • Institute of Nanotechnology
    (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
    Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
    Germany
  • Laboratory for Bio- and Nano- Instrumentation
    (LBNI), Ecole Polytechnique Federale De Lausanne (EPFL), CH-1015
    Lausanne, Switzerland
  • Institute of Nanotechnology
    (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
    Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
    Germany
  • Institute of Nanotechnology
    (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
    Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
    Germany
autor
  • Institute of Nanotechnology
    (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
    Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
    Germany
Bibliografia
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Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.-psjd-doi-10_1515_nanofab-2015-0002
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